Patents by Inventor Randy Grilly

Randy Grilly has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma source device and methods
    Patent number: 10224186
    Abstract: This disclosure describes a remote plasma source, a gas input manifold, and related methods of making and using. In some examples, a remote plasma source is provided with a plasma chamber, a gas input manifold, and an output region. The remote plasma source also has means for introducing a gas into the plasma chamber, the means for introducing configured to impart a radial velocity and a longitudinal velocity on the gas, relative to a longitudinal axis through the remote plasma source.
    Type: Grant
    Filed: March 10, 2016
    Date of Patent: March 5, 2019
    Assignee: AES Global Holdings, PTE. LTD
    Inventors: Scott Polak, Daniel Carter, Karen Peterson, Randy Grilly, Mike Thornton, Daniel J. Hoffman
  • Plasma Source Device and Methods
    Publication number: 20160268104
    Abstract: This disclosure describes a remote plasma source, a gas input manifold, and related methods of making and using. In some examples, a remote plasma source is provided with a plasma chamber, a gas input manifold, and an output region. The remote plasma source also has means for introducing a gas into the plasma chamber, the means for introducing configured to impart a radial velocity and a longitudinal velocity on the gas, relative to a longitudinal axis through the remote plasma source.
    Type: Application
    Filed: March 10, 2016
    Publication date: September 15, 2016
    Inventors: Scott Polak, Daniel Carter, Karen Peterson, Randy Grilly, Mike Thornton, Daniel J. Hoffman
  • Projected Plasma Source
    Publication number: 20130001196
    Abstract: This disclosure describes systems, methods, and apparatuses for generating an ionizing electromagnetic field via a remote plasma source such that the field controllably extends through a field projection portion where the field attenuates, to a plasma processing portion where the field is attenuated but still strong enough to sustain a plasma. The plasma has a low voltage and RF energy and can be used for a variety of semiconductor and thin film processing operations including chamber cleaning via radical generation, etching, and deposition.
    Type: Application
    Filed: June 30, 2011
    Publication date: January 3, 2013
    Inventors: Daniel J. Hoffman, Daniel Carter, Karen Peterson, Randy Grilly