Patents by Inventor Randy J. Shul

Randy J. Shul has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230223273
    Abstract: The present invention relates to methods of delayering a semiconductor integrated circuit die or wafer. In at least one aspect, the method includes exposing a die or wafer to plasma of an etching gas and detecting exposure of one or more metal layers within the die. In one aspect of the invention, the plasma of the etching gas is non-selective and removes all materials in a layer at about the same rate. In another aspect of the invention, two different plasmas of corresponding etching gases are employed with each plasma of the etching gas being selective, thus necessitating the sequential use of both plasmas of corresponding etching gases to remove all materials in a layer.
    Type: Application
    Filed: February 14, 2023
    Publication date: July 13, 2023
    Inventors: Randy J. Shul, Caitlin Rochford Friedman, Gregory Paul Salazar, Michael J. Rye, John Mudrick, Craig Y. Nakakura, Jeffry Joseph Sniegowski, Karl Douglas Greth
  • Patent number: 11664238
    Abstract: The present invention relates to methods of delayering a semiconductor integrated circuit die or wafer. In at least one aspect, the method includes exposing a die or wafer to plasma of an etching gas and detecting exposure of one or more metal layers within the die. In one aspect of the invention, the plasma of the etching gas is non-selective and removes all materials in a layer at about the same rate. In another aspect of the invention, two different plasmas of corresponding etching gases are employed with each plasma of the etching gas being selective, thus necessitating the sequential use of both plasmas of corresponding etching gases to remove all materials in a layer.
    Type: Grant
    Filed: July 29, 2020
    Date of Patent: May 30, 2023
    Assignee: National Technology & Engineering Solutions of Sandia, LLC
    Inventors: Randy J. Shul, Caitlin Rochford Friedman, Gregory Paul Salazar, Michael J. Rye, John Mudrick, Craig Y. Nakakura, Jeffry Joseph Sniegowski, Karl Douglas Greth
  • Patent number: 10446369
    Abstract: Various technologies for providing an operator of a focused ion beam (FIB) system with navigational and processing data are described herein. An exemplary system includes a broadband light source and a narrowband light source that emit light to a target of the FIB. An optical detector receives reflections of the broadband light from the target and outputs data that is used to generate two-dimensional images of the target in a region near a location of incidence of the FIB at the target. An interferometer receives reflections of the narrowband light from the target and outputs data indicative of an interference pattern of the narrowband reflections. A computing device computes a thickness of one or more material layers that make up the target based upon the interference pattern. A two-dimensional image of the target and an indication of the computed thickness are then displayed to the operator of the FIB.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: October 15, 2019
    Assignee: National Technology & Engineering Solutions of Sandia, LLC
    Inventors: Brian Scott Phillips, Steven Norris Ball, Gregory Paul Salazar, Randy J. Shul
  • Patent number: 10262931
    Abstract: The present invention relates to a lateral via to provide an electrical connection to a buried conductor. In one instance, the buried conductor is a through via that extends along a first dimension, and the lateral via extends along a second dimension that is generally orthogonal to the first dimension. In another instance, the second dimension is oblique to the first dimension. Components having such lateral vias, as well as methods for creating such lateral vias are described herein.
    Type: Grant
    Filed: May 15, 2018
    Date of Patent: April 16, 2019
    Assignees: National Technology & Engineering Solutions of Sandia, LLC, Varioscale, Inc.
    Inventors: David P. Adams, Kira L. Fishgrab, Karl Douglas Greth, Michael David Henry, Jeffrey Stevens, V. Carter Hodges, Randy J. Shul, Ronald S. Goeke, Robert K. Grubbs, Scott Silverman
  • Patent number: 10217704
    Abstract: Various technologies for simultaneously making a plurality of modifications to a previously manufactured semiconductor are described herein. A mask layer is applied to a surface of the previously manufactured semiconductor device. A pattern is formed in the mask layer, where the pattern is aligned with a plurality of features of the semiconductor device that are desirably modified. Layers of the semiconductor device are etched based on the pattern to create a plurality of vias that each extend through one or more layers of the semiconductor device to a respective feature of the device. A conducting material is deposited into the vias to form a plurality of conducting plugs. Conducting material may be further deposited on the surface of the semiconductor device to connect plugs to one another and/or connect plugs to surface features of the device, thereby forming a plurality of new connections between features of the semiconductor device.
    Type: Grant
    Filed: October 26, 2017
    Date of Patent: February 26, 2019
    Assignee: National Technology & Engineering Solutions of Sandia, LLC
    Inventors: Randy J. Shul, Jeffry J. Sniegowski, Kurt W. Larson, William A. Zortman
  • Publication number: 20180269143
    Abstract: The present invention relates to a lateral via to provide an electrical connection to a buried conductor. In one instance, the buried conductor is a through via that extends along a first dimension, and the lateral via extends along a second dimension that is generally orthogonal to the first dimension. In another instance, the second dimension is oblique to the first dimension. Components having such lateral vias, as well as methods for creating such lateral vias are described herein.
    Type: Application
    Filed: May 15, 2018
    Publication date: September 20, 2018
    Inventors: David P. Adams, Kira L. Fishgrab, Karl Douglas Greth, Michael David Henry, Jeffrey Stevens, V. Carter Hodges, Randy J. Shul, Ronald S. Goeke, Robert K. Grubbs, Scott Silverman
  • Patent number: 9972565
    Abstract: The present invention relates to a lateral via to provide an electrical connection to a buried conductor. In one instance, the buried conductor is a through via that extends along a first dimension, and the lateral via extends along a second dimension that is generally orthogonal to the first dimension. In another instance, the second dimension is oblique to the first dimension. Components having such lateral vias, as well as methods for creating such lateral vias are described herein.
    Type: Grant
    Filed: June 7, 2016
    Date of Patent: May 15, 2018
    Assignee: National Technology & Engineering Solutions of Sandia, LLC
    Inventors: David P. Adams, Kira L. Fishgrab, Karl Douglas Greth, Michael David Henry, Jeffrey Stevens, V. Carter Hodges, Randy J. Shul, Ronald S. Goeke, Robert K. Grubbs
  • Patent number: 8597985
    Abstract: In wafer-level packaging of microelectromechanical (MEMS) devices a lid wafer is bonded to a MEMS wafer in a predetermined aligned relationship. Portions of the lid wafer are removed to separate the lid wafer into lid portions that respectively correspond in alignment with MEMS devices on the MEMS wafer, and to expose areas of the MEMS wafer that respectively contain sets of bond pads respectively coupled to the MEMS devices.
    Type: Grant
    Filed: February 1, 2012
    Date of Patent: December 3, 2013
    Assignee: Sandia Corporation
    Inventors: Rajen Chanchani, Christopher Nordquist, Roy H. Olsson, Tracy C. Peterson, Randy J. Shul, Catalina Ahlers, Thomas A. Plut, Gary A. Patrizi
  • Patent number: 8236611
    Abstract: A method is disclosed for singulating die from a substrate having a sacrificial layer and one or more device layers, with a retainer being formed in the device layer(s) and anchored to the substrate. Deep Reactive Ion Etching (DRIE) etching of a trench through the substrate from the bottom side defines a shape for each die. A handle wafer is then attached to the bottom side of the substrate, and the sacrificial layer is etched to singulate the die and to form a frame from the retainer and the substrate. The frame and handle wafer, which retain the singulated die in place, can be attached together with a clamp or a clip and to form a package for the singulated die. One or more stops can be formed from the device layer(s) to limit a sliding motion of the singulated die.
    Type: Grant
    Filed: April 13, 2010
    Date of Patent: August 7, 2012
    Assignee: Sandia Corporation
    Inventors: Robert C. Anderson, Randy J. Shul, Peggy J. Clews, Michael S. Baker, Maarten P. De Boer
  • Patent number: 7383774
    Abstract: A two-stage acceleration sensing apparatus is disclosed which has applications for use in a fuze assembly for a projected munition. The apparatus, which can be formed by bulk micromachining or LIGA, can sense acceleration components along two orthogonal directions to enable movement of a shuttle from an “as-fabricated” position to a final position and locking of the shuttle in the final position. With the shuttle moved to the final position, the apparatus can perform one or more functions including completing an explosive train or an electrical switch closure, or allowing a light beam to be transmitted through the device.
    Type: Grant
    Filed: March 22, 2006
    Date of Patent: June 10, 2008
    Assignee: Sandia Corporation
    Inventors: David R. Koehler, Darren A. Hoke, Louis S. Weichman, George E. Vernon, Randy J. Shul, Michael H. Beggans
  • Patent number: 7148436
    Abstract: An acceleration-sensing apparatus is disclosed which includes a moveable shuttle (i.e. a suspended mass) and a latch for capturing and holding the shuttle when an acceleration event is sensed above a predetermined threshold level. The acceleration-sensing apparatus provides a switch closure upon sensing the acceleration event and remains latched in place thereafter. Examples of the acceleration-sensing apparatus are provided which are responsive to an acceleration component in a single direction (i.e. a single-sided device) or to two oppositely-directed acceleration components (i.e. a dual-sided device). A two-stage acceleration-sensing apparatus is also disclosed which can sense two acceleration events separated in time. The acceleration-sensing apparatus of the present invention has applications, for example, in an automotive airbag deployment system.
    Type: Grant
    Filed: August 14, 2003
    Date of Patent: December 12, 2006
    Assignee: Sandia Corporation
    Inventors: Robb M. Lee, Randy J. Shul, Marc A. Polosky, Darren A. Hoke, George E. Vernon
  • Patent number: 7105098
    Abstract: New methods for fabrication of silicon microstructures have been developed. In these methods, an etching delay layer is deposited and patterned so as to provide differential control on the depth of features being etched into a substrate material. Compensation for etching-related structural artifacts can be accomplished by proper use of such an etching delay layer.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: September 12, 2006
    Assignee: Sandia Corporation
    Inventors: Randy J. Shul, Christi G. Willison, W. Kent Schubert, Ronald P. Manginell, Mary-Anne Mitchell, Paul C. Galambos
  • Patent number: 7051656
    Abstract: A two-stage acceleration sensing apparatus is disclosed which has applications for use in a fuze assembly for a projected munition. The apparatus, which can be formed by bulk micromachining or LIGA, can sense acceleration components along two orthogonal directions to enable movement of a shuttle from an “as-fabricated” position to a final position and locking of the shuttle in the final position. With the shuttle moved to the final position, the apparatus can perform one or more functions including completing an explosive train or an electrical switch closure, or allowing a light beam to be transmitted through the device.
    Type: Grant
    Filed: August 14, 2003
    Date of Patent: May 30, 2006
    Assignee: Sandia Corporation
    Inventors: David R. Koehler, Darren A. Hoke, Louis S. Weichman, George E. Vernon, Randy J. Shul, Michael H. Beggans
  • Patent number: 6930051
    Abstract: New methods for fabrication of silicon microstructures have been developed. In these methods, an etching delay layer is deposited and patterned so as to provide differential control on the depth of features being etched into a substrate material. Structures having features with different depth can be formed thereby in a single etching step.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: August 16, 2005
    Assignee: Sandia Corporation
    Inventors: Ronald P. Manginell, W. Kent Schubert, Randy J. Shul
  • Patent number: 6823720
    Abstract: A method for sensing a chemical analyte in a fluid stream comprises providing a microfabricated teeter-totter resonator that relies upon a Lorentz force to cause oscillation in a paddle, applying a static magnetic field substantially aligned in-plane with the paddle, energizing a current conductor line on a surface of the paddle with an alternating electrical current to generate the Lorentz force, exposing the resonator to the analyte, and detecting the response of the oscillatory motion of the paddle to the chemical analyte. Preferably, a chemically sensitive coating is disposed on at least one surface of the paddle to enhance the sorption of the analyte by the paddle. The concentration of the analyte in a fluid stream can be determined by measuring the change in the resonant frequency or phase of the teeter-totter resonator as the chemical analyte is added to or removed from the paddle.
    Type: Grant
    Filed: May 12, 2003
    Date of Patent: November 30, 2004
    Assignee: Sandia Corporation
    Inventors: Douglas Ray Adkins, Edwin J. Heller, Randy J. Shul
  • Patent number: 6820469
    Abstract: A microfabricated teeter-totter resonator comprises a frame, a paddle pivotably anchored to the frame by pivot arms that define an axis of rotation, a current conductor line on a surface of the paddle, means for applying a static magnetic field substantially perpendicular to the rotational axis and in the plane of the paddle, and means for energizing the current conductor line with an alternating current. A Lorentz force is generated by the interaction of the magnetic field with the current flowing in the conductor line, causing the paddle to oscillate about the axis of rotation. The teeter-totter resonator can be fabricated with micromachining techniques with materials used in the integrated circuits manufacturing industry. The microfabricated teeter-totter resonator has many varied applications, both as an actuation device and as a sensor.
    Type: Grant
    Filed: May 12, 2003
    Date of Patent: November 23, 2004
    Assignee: Sandia Corporation
    Inventors: Douglas Ray Adkins, Edwin J. Heller, Randy J. Shul
  • Patent number: 6660648
    Abstract: A new class of semipermeable membranes, and techniques for their fabrication, have been developed. These membranes, formed by appropriate etching of a deposited silicon nitride layer, are robust, easily manufacturable, and compatible with a wide range of silicon micromachining techniques.
    Type: Grant
    Filed: October 2, 2000
    Date of Patent: December 9, 2003
    Assignee: Sandia Corporation
    Inventors: Paul Charles Galambos, Randy J. Shul, Christi Gober Willison
  • Patent number: 6472332
    Abstract: Structures for use in conjunction with surface micromachined structures are formed using a two-step etching process. In various exemplary embodiments, the two-step etching process comprises a modified Bosch etch. According to various exemplary embodiments of the two-step etch, first mask and second masks are used to prepare a layer for etching one or more desired structures. The first mask is used to define at least one large feature. The second mask is used to define at least one small feature (small as compared to the at least one large feature). The second mask is formed over the first mask which is formed over the layer. In the first etching step, the at least one small feature is etched into the layer. Then, the second mask is removed using the chemical rinsing agent. In the second etching step, the at least one large feature is etched into the layer such that the at least one small feature propagates further into the layer ahead of the at least one large feature. The first mask is then removed.
    Type: Grant
    Filed: November 28, 2000
    Date of Patent: October 29, 2002
    Assignee: Xerox Corporation
    Inventors: Arthur M. Gooray, George J. Roller, Joseph M. Crowley, Paul C. Galambos, Frank J. Peter, Kevin R. Zavadil, Richard C. Givler, Randy J. Shul, Christi Willison Gober
  • Patent number: 6432577
    Abstract: An apparatus and method for fabricating a microbattery that uses silicon as the structural component, packaging component, and semiconductor to reduce the weight, size, and cost of thin film battery technology is described. When combined with advanced semiconductor packaging techniques, such a silicon-based microbattery enables the fabrication of autonomous, highly functional, integrated microsystems having broad applicability.
    Type: Grant
    Filed: June 29, 2000
    Date of Patent: August 13, 2002
    Assignee: Sandia Corporation
    Inventors: Randy J. Shul, Stanley H. Kravitz, Todd R. Christenson, Thomas E. Zipperian, David Ingersoll
  • Patent number: 5866925
    Abstract: An all-ion implanted gallium-nitride (GaN) junction field-effect transistor (JFET) and method of making the same. Also disclosed are various ion implants, both n- and p-type, together with or without phosphorous co-implantation, in selected III-V semiconductor materials.
    Type: Grant
    Filed: January 9, 1997
    Date of Patent: February 2, 1999
    Assignee: Sandia Corporation
    Inventors: John C. Zolper, Randy J. Shul