Patents by Inventor Randy Schmieding

Randy Schmieding has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for PVD dielectric deposition
    Patent number: 9928997
    Abstract: Apparatus for physical vapor deposition of dielectric material is provided herein. In some embodiments, a chamber lid of a physical vapor deposition chamber includes an inner magnetron assembly coupled to an inner target assembly, and an outer magnet assembly coupled to an outer target assembly, wherein the inner magnetron assembly and the inner target assembly are electrically isolated from the outer magnet assembly and the outer target assembly.
    Type: Grant
    Filed: February 9, 2015
    Date of Patent: March 27, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Keith A. Miller, Thanh X. Nguyen, Ilya Lavitsky, Randy Schmieding, Prashanth Kothnur
  • APPARATUS FOR PVD DIELECTRIC DEPOSITION
    Publication number: 20160172168
    Abstract: Apparatus for physical vapor deposition of dielectric material is provided herein. In some embodiments, a chamber lid of a physical vapor deposition chamber includes an inner magnetron assembly coupled to an inner target assembly, and an outer magnet assembly coupled to an outer target assembly, wherein the inner magnetron assembly and the inner target assembly are electrically isolated from the outer magnet assembly and the outer target assembly.
    Type: Application
    Filed: February 9, 2015
    Publication date: June 16, 2016
    Inventors: Keith A. Miller, THANH X. NGUYEN, ILYA LAVITSKY, RANDY SCHMIEDING, PRASHANTH KOTHNUR
  • Method and apparatus for shielding a device from a semiconductor wafer process chamber
    Patent number: 6620250
    Abstract: A method and apparatus for shielding a device, such as a pump, from a process chamber of a semiconductor wafer processing system. The apparatus comprises a shield connected to a mounting portion. The mounting portion has a fluid passage wherein the temperature of the apparatus is regulated by flowing fluid through the passage.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: September 16, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Thomas B. Brezoczky, Randy Schmieding, Gene Y. Kohara
  • Method and apparatus for shielding a device from a semiconductor wafer process chamber
    Publication number: 20020166632
    Abstract: A method and apparatus for shielding a device, such as a pump, from a process chamber of a semiconductor wafer processing system. The apparatus comprises a shield connected to a mounting portion. The mounting portion has a fluid passage wherein the temperature of the apparatus is regulated by flowing fluid through the passage.
    Type: Application
    Filed: November 9, 2001
    Publication date: November 14, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Thomas B. Brezoczky, Randy Schmieding, Gene Y. Kohara