Patents by Inventor Ranee W.-L. Kwong

Ranee W.-L. Kwong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dry developable photoresist compositions and method for use thereof
    Patent number: 5322765
    Abstract: Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of being inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.
    Type: Grant
    Filed: November 22, 1991
    Date of Patent: June 21, 1994
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Willard E. Conley, Ranee W.-L. Kwong, Leo L. Linehan, Scott A. MacDonald, Harbans S. Sachdev, Hubert Schlosser, Carlton G. Willson