Abstract: Multi version library cell handling and integrated circuit structures fabricated therefrom are described. In an example, an integrated circuit structure includes a plurality of gate lines parallel along a first direction of a substrate and having a pitch along a second direction orthogonal to the first direction. A first version of a cell type is over a first portion of the plurality of gate lines, the first version of the cell type including a first plurality of interconnect lines having a second pitch along the second direction, the second pitch less than the first pitch.

Abstract: A method of forming an integrated circuit structure is provided. The method includes: providing a logic cell structure including a first input node, a second input node, and a pulling network connected to a reference voltage and an output node, wherein the pulling network includes a plurality of transistor segments; determining a delay associated with at least one of the first input node and the second input node; and connecting the plurality of transistor segments to the first input node, the second input node and the output node based at least in part on the determined delay.

Abstract: A method includes arranging first and second rows of gate regions in a cell. The first row has a first width extending from first to last gate regions and equal to a first multiple of a gate region pitch. The second row has a second width extending from first to last gate regions and equal to a second multiple of the gate region pitch greater than the first multiple. The method includes defining first through fourth cell border segments by extending the first and second segments along the first and last gate regions of the first row, and extending the third and fourth segments along the first and last gate regions of the second row, whereby the border is non-rectangular based on one or both of the first and third segments or the second and fourth segments being unaligned with each other, and storing the cell in a storage device.

Abstract: A method of forming an integrated circuit structure is provided. The method includes: providing a logic cell structure including a first input node, a second input node, and a pulling network connected to a reference voltage and an output node, wherein the pulling network includes a plurality of transistor segments; determining a delay associated with at least one of the first input node and the second input node; and connecting the plurality of transistor segments to the first input node, the second input node and the output node based at least in part on the determined delay.

Abstract: Multi version library cell handling and integrated circuit structures fabricated therefrom are described. In an example, an integrated circuit structure includes a plurality of gate lines parallel along a first direction of a substrate and having a pitch along a second direction orthogonal to the first direction. A first version of a cell type is over a first portion of the plurality of gate lines, the first version of the cell type including a first plurality of interconnect lines having a second pitch along the second direction, the second pitch less than the first pitch.

Abstract: Multi version library cell handling and integrated circuit structures fabricated therefrom are described. In an example, an integrated circuit structure includes a plurality of gate lines parallel along a first direction of a substrate and having a pitch along a second direction orthogonal to the first direction. A first version of a cell type is over a first portion of the plurality of gate lines, the first version of the cell type including a first plurality of interconnect lines having a second pitch along the second direction, the second pitch less than the first pitch.

Abstract: Integrated circuit (IC) cell architectures including a crenellated interconnect trace layout. A crenellated trace layout may be employed where an IC cell includes transistor having a source/drain terminal interconnected through a back-side (3D) routing scheme that reduces front-side routing density for a given transistor footprint. In the crenellated layout, adjacent interconnect traces or tracks may have their ends staggered according to a crenellation phase for the cell. Crenellated tracks may intersect one cell boundary with adjacent tracks intersecting an opposite cell boundary. Track ends may be offset by at least the width of an underlying orthogonal interconnect trace. Crenellated track ends may be offset by the width of an underlying orthogonal interconnect trace and half a spacing between adjacent orthogonal interconnect traces.

Abstract: Disclosed is a device for generating a toroidal source of illumination is disclosed. The device comprises a translucent disc with a concentric hole. A planar coil of side emitting optic fiber is disposed on one surface of the disc. The coil is energized with an LED at one end of the coil. The light emitted by the side of the coil is randomly scattered by the disc producing a toroidal source of light at the other surface of the disc. This source is used with instruments for assessing the dryness of the human eye. Further embodiments describe adaptations for measuring tear breakup time and the height of the tear meniscus in the human eye.

Abstract: A method of forming an integrated circuit structure is provided. The method includes: providing a logic cell structure including a first input node, a second input node, and a pulling network connected to a reference voltage and an output node, wherein the pulling network includes a plurality of transistor segments; determining a delay associated with at least one of the first input node and the second input node; and connecting the plurality of transistor segments to the first input node, the second input node and the output node based at least in part on the determined delay.

Abstract: A method of forming an integrated circuit structure is provided. The method includes: providing a logic cell structure including a first input node, a second input node, and a pulling network connected to a reference voltage and an output node, wherein the pulling network includes a plurality of transistor segments; determining a delay associated with at least one of the first input node and the second input node; and connecting the plurality of transistor segments to the first input node, the second input node and the output node based at least in part on the determined delay.

Abstract: Embodiments disclosed herein include a semiconductor device. In an embodiment, the semiconductor device comprises a substrate, and a cell on the substrate. In an embodiment, the cell comprises a plurality of transistors over the substrate, and a first metal layer over the plurality of transistors. In an embodiment, the first metal layer comprises a first power line, wherein a width of the first power line is entirely within the cell, a second power line, wherein a width of the second power line is entirely within the cell, and a plurality of signal lines between the first power line and the second power line.

Abstract: This disclosure discloses an apparatus and method thereof for a comprehensive visual function testing apparatus. A plurality of visual test stimuli may be spatiotemporally sequenced and presented to the subject undergoing visual function tests including, but not limited to, visual acuity test, stereoscopic vision test, field of vision test and contrast sensitivity test. Furthermore, by combining all the elements under the same computational device, it streamlines the conventional visual function testing process, provides automated visual function testing of subjects, and refraction correction when required, such as for perimetry testing. Such an apparatus opens up unprecedented possibilities for refining the visual function testing process. High degree of integration resulting from adoption of the features disclosed, a variety of compact, portable, wearable embodiments may be achieved.

Abstract: An integrated circuit structure includes a cell on a metal level, the cell defined by a cell boundary. A plurality of substantially parallel interconnect lines are inside the cell boundary. A first power track and a second power track are both dedicated to power and are located completely inside the cell boundary without any power tracks along the cell boundary on the metal level.

Abstract: Vertical integration schemes and circuit elements architectures for area scaling of semiconductor devices are described. In an example, an inverter structure includes a semiconductor fin separated vertically into an upper region and a lower region. A first plurality of gate structures is included for controlling the upper region of the semiconductor fin. A second plurality of gate structures is included for controlling the lower region of the semiconductor fin. The second plurality of gate structures has a conductivity type opposite the conductivity type of the first plurality of gate structures.

Abstract: Vertical integration schemes and circuit elements architectures for area scaling of semiconductor devices are described. In an example, an inverter structure includes a semiconductor fin separated vertically into an upper region and a lower region. A first plurality of gate structures is included for controlling the upper region of the semiconductor fin. A second plurality of gate structures is included for controlling the lower region of the semiconductor fin. The second plurality of gate structures has a conductivity type opposite the conductivity type of the first plurality of gate structures.

Abstract: A method of forming an integrated circuit structure is provided. The method includes: providing a logic cell structure including a first input node, a second input node, and a pulling network connected to a reference voltage and an output node, wherein the pulling network includes a plurality of transistor segments; determining a delay associated with at least one of the first input node and the second input node; and connecting the plurality of transistor segments to the first input node, the second input node and the output node based at least in part on the determined delay.

Abstract: An integrated circuit structure includes a first metal level comprising a first plurality of interconnect lines along a first direction. A cell is on at least the first metal level, the cell having a pin comprising more than two of the first plurality of interconnect lines. A second metal level comprising a second plurality of interconnect lines overlays the first metal level, where the second plurality of interconnect lines is along a second direction. Two or more vias are on at least one of the second plurality of interconnect lines to connect to the pin.

Abstract: Multi version library cell handling and integrated circuit structures fabricated therefrom are described. In an example, an integrated circuit structure includes a plurality of gate lines parallel along a first direction of a substrate and having a pitch along a second direction orthogonal to the first direction. A first version of a cell type is over a first portion of the plurality of gate lines, the first version of the cell type including a first plurality of interconnect lines having a second pitch along the second direction, the second pitch less than the first pitch.

Abstract: Multi version library cell handling and integrated circuit structures fabricated therefrom are described. In an example, an integrated circuit structure includes a plurality of gate lines parallel along a first direction of a substrate and having a pitch along a second direction orthogonal to the first direction. A first version of a cell type is over a first portion of the plurality of gate lines, the first version of the cell type including a first plurality of interconnect lines having a second pitch along the second direction, the second pitch less than the first pitch.

Abstract: Integrated circuit (IC) cell architectures including a crenellated interconnect trace layout. A crenellated trace layout may be employed where an IC cell includes transistor having a source/drain terminal interconnected through a back-side (3D) routing scheme that reduces front-side routing density for a given transistor footprint. In the crenellated layout, adjacent interconnect traces or tracks may have their ends staggered according to a crenellation phase for the cell. Crenellated tracks may intersect one cell boundary with adjacent tracks intersecting an opposite cell boundary. Track ends may be offset by at least the width of an underlying orthogonal interconnect trace. Crenellated track ends may be offset by the width of an underlying orthogonal interconnect trace and half a spacing between adjacent orthogonal interconnect traces.