Patents by Inventor Ranty H. Liang

Ranty H. Liang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Silicon containing electroconductive polymers and structures made therefrom
    Patent number: 5066748
    Abstract: An electropolymerized film comprised of polymers and copolymers of a monomer having the general formula: ##STR1## is formed on the surface of an anode. The finished structures have superior electrical and mechanical properties for use in applications such as electrostatic dissipation and for the reduction of the radar cross section of advanced aircraft.
    Type: Grant
    Filed: February 7, 1990
    Date of Patent: November 19, 1991
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Ganesan Nagasubramanian, Salvador DiStefano, Ranty H. Liang
  • Internal stabilization of polycarbonate resins
    Patent number: 4945001
    Abstract: A new polycarbonate copolymer resin is formed by internal generation of stabilizers bound to the polymer chain. Irradiation of a solid piece or a deoxygenated solution of the resin at a first frequency below 300 nm generates 2 to 8 mol percent of phenyl salicylate groups which are rearranged to dihydroxybenzophenone groups by irradiating the resin under oxygen excluding conditions at a second frequency from 300 to 320 nm.
    Type: Grant
    Filed: May 31, 1988
    Date of Patent: July 31, 1990
    Assignee: California Institute of Technology
    Inventors: Amitava Gupta, Ranty H. Liang, Andre H. Yavrouian
  • Internal stabilization of polycarbonate resins by two stage radiation process
    Patent number: 4749726
    Abstract: A new polycarbonate copolymer resin is formed by internal generation of stabilizers bound to the polymer chain. Irradiation of a solid piece or a deoxygenated solution of the resin at a first frequency below 300 nm generates 2 to 8 mol percent of phenyl salicylate groups which are rearranged to dihydroxybenzophenone groups by irradiating the resin under oxygen excluding conditions at a second frequency from 300 to 320 nm.
    Type: Grant
    Filed: December 8, 1986
    Date of Patent: June 7, 1988
    Assignee: California Institute of Technology
    Inventors: Amitava Gupta, Ranty H. Liang, Andre H. Yavrouian