Patents by Inventor Rao V. Mulpuri

Rao V. Mulpuri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210072245
    Abstract: Methods are provided for predicting and diagnosing the presence of breast cancer, as well as for assessing the therapeutic efficacy of a cancer treatment and determining whether a subject potentially is developing cancer.
    Type: Application
    Filed: May 12, 2020
    Publication date: March 11, 2021
    Inventors: David E. Reese, Rao V. Mulpuri, Meredith C. Henderson, Kasey Lee Benson
  • Publication number: 20160069883
    Abstract: Methods are provided for predicting and diagnosing the presence of breast cancer, as well as for assessing the therapeutic efficacy of a cancer treatment and determining whether a subject potentially is developing cancer.
    Type: Application
    Filed: September 4, 2015
    Publication date: March 10, 2016
    Inventors: David E. Reese, Rao V. Mulpuri, Meredith C. Henderson, Kasey Lee Benson
  • Patent number: 7994027
    Abstract: The present invention grows nanostructures using a microwave heating-based sublimation-sandwich SiC polytype growth method comprising: creating a sandwich cell by placing a source wafer parallel to a substrate wafer, leaving a small gap between the source wafer and the substrate wafer; placing a microwave heating head around the sandwich cell to selectively heat the source wafer to a source wafer temperature and the substrate wafer to a substrate wafer temperature; creating a temperature gradient between the source wafer temperature and the substrate wafer temperature; sublimating Si- and C-containing species from the source wafer, producing Si- and C-containing vapor species; converting the Si- and C-containing vapor species into liquid metallic alloy nanodroplets by allowing the metalized substrate wafer to absorb the Si- and C-containing vapor species; and growing nanostructures on the substrate wafer once the alloy droplets reach a saturation point for SiC.
    Type: Grant
    Filed: May 11, 2009
    Date of Patent: August 9, 2011
    Assignees: George Mason Intellectual Properties, Inc., NIST
    Inventors: Yonglai Tian, Rao V. Mulpuri, Siddharth G. Sundaresan, Albert V. Davydov
  • Publication number: 20100147835
    Abstract: The present invention involves annealing methods for doped gallium nitride (GaN). In one embodiment, one method includes placing, within a heating unit, a silicon carbide (SiC) wafer as a susceptor in close proximity with a doped GaN epilayer, wherein the doped GaN epilayer is either a GaN layer grown on a substrate or a GaN layer that is free standing; and heating, at a heating rate of at least about 100° C./s, the wafer and the doped GaN epilayer to at least about 1200° C. In another embodiment, another method includes placing, within a heating unit, a doped GaN epilayer, wherein the doped GaN epilayer is either a GaN layer grown on a conducting substrate or a GaN layer that is free standing; and heating, at a heating rate of at least about 100° C./s, the doped GaN epilayer to at least about 1200° C.
    Type: Application
    Filed: May 11, 2009
    Publication date: June 17, 2010
    Inventors: Rao V. Mulpuri, Yonglai Tian, Siddarth G. Sundaresan
  • Publication number: 20100068871
    Abstract: The present invention grows nanostructures using a microwave heating-based sublimation-sandwich SiC polytype growth method comprising: creating a sandwich cell by placing a source wafer parallel to a substrate wafer, leaving a small gap between the source wafer and the substrate wafer; placing a microwave heating head around the sandwich cell to selectively heat the source wafer to a source wafer temperature and the substrate wafer to a substrate wafer temperature; creating a temperature gradient between the source wafer temperature and the substrate wafer temperature; sublimating Si- and C-containing species from the source wafer, producing Si- and C-containing vapor species; converting the Si- and C-containing vapor species into liquid metallic alloy nanodroplets by allowing the metalized substrate wafer to absorb the Si- and C-containing vapor species; and growing nanostructures on the substrate wafer once the alloy droplets reach a saturation point for SiC.
    Type: Application
    Filed: May 11, 2009
    Publication date: March 18, 2010
    Inventors: Yonglai Tian, Rao V. Mulpuri, Siddarth G. Sundaresan, Albert V. Davydov