Patents by Inventor Raoul Zerne

Raoul Zerne has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for performing alignment using reference board
    Patent number: 8934081
    Abstract: An alignment method for the of patterning a work piece in a direct write machine, wherein a reference board provided with board reference features is used to coordinate calibration of a measurement station and a writing station against a common reference. An adjusted pattern is for writing on the work piece is calculated relative to the position of the reference board.
    Type: Grant
    Filed: February 28, 2011
    Date of Patent: January 13, 2015
    Assignee: Mycronic AB
    Inventors: Mikael Wahlsten, Raoul Zerne
  • Method and apparatus for performing alignment using reference board
    Publication number: 20110228242
    Abstract: An alignment method for the of patterning a work piece in a direct write machine, wherein a reference board provided with board reference features is used to coordinate calibration of a measurement station and a writing station against a common reference. An adjusted pattern is for writing on the work piece is calculated relative to the position of the reference board.
    Type: Application
    Filed: February 28, 2011
    Publication date: September 22, 2011
    Inventors: Mikael Wahlsten, Raoul Zerne
  • PSM alignment method and device
    Patent number: 7411651
    Abstract: The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a mask or reticle, and to producing a layer of a device using the mask or reticle. Particular aspects of the present invention are described in the claims, specification and drawings.
    Type: Grant
    Filed: August 4, 2004
    Date of Patent: August 12, 2008
    Assignee: Micronic Laser Systems AB
    Inventors: Thomas Ostrom, Raoul Zerne
  • PSM alignment method and device
    Publication number: 20050053273
    Abstract: The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a mask or reticle, and to producing a layer of a device using the mask or reticle. Particular aspects of the present invention are described in the claims, specification and drawings.
    Type: Application
    Filed: August 4, 2004
    Publication date: March 10, 2005
    Applicant: Micronic Laser Systems AB
    Inventors: Thomas Ostrom, Raoul Zerne