Patents by Inventor Raphael M. Manalo

Raphael M. Manalo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230193502
    Abstract: A wafer plating fixture for use in simultaneously electroplating a two substrates. The wafer plating fixture including: an electrically conductive carrier bus; a plurality of contact clips electrically coupled to the carrier bus and configured to hold the two substrates in place and electrically couple the two substrates to the carrier bus; and a non-conductive substrate backer to separate the two substrates coupled to the carrier bus. A method of electroplating a plurality of substrates. The method including: mounting two substrates to be plated onto a wafer plating fixture; mounting the wafer plating fixture on a continuous belt of plating system; dipping the wafer plating fixture with the two substrates held thereon into an electroplating bath; and applying a voltage to the two substrates via the wafer plating fixture.
    Type: Application
    Filed: February 8, 2023
    Publication date: June 22, 2023
    Inventors: Hung-Ming Wang, Paul W. Loscutoff, Raphael M. Manalo, Arnold V. Castillo, Mohamad Ridzwan Mustafa, Mark A. Kleshock, Neil G. Bergstrom
  • Patent number: 11598018
    Abstract: A wafer plating fixture for use in simultaneously electroplating a two substrates. The wafer plating fixture including: an electrically conductive carrier bus; a plurality of contact clips electrically coupled to the carrier bus and configured to hold the two substrates in place and electrically couple the two substrates to the carrier bus; and a non-conductive substrate backer to separate the two substrates coupled to the carrier bus. A method of electroplating a plurality of substrates. The method including: mounting two substrates to be plated onto a wafer plating fixture; mounting the wafer plating fixture on a continuous belt of plating system; dipping the wafer plating fixture with the two substrates held thereon into an electroplating bath; and applying a voltage to the two substrates via the wafer plating fixture.
    Type: Grant
    Filed: March 7, 2019
    Date of Patent: March 7, 2023
    Assignee: SunPower Corporation
    Inventors: Hung-Ming Wang, Paul W. Loscutoff, Raphael M. Manalo, Arnold V. Castillo, Mohamad Ridzwan Mustafa, Mark A. Kleshock, Neil G. Bergstrom
  • Publication number: 20200105951
    Abstract: A solar cell can include a first plurality of metal contact fingers, and a second plurality of metal contact fingers interdigitated with the first plurality of metal contact fingers, wherein at least one of the first plurality of metal contact fingers comprises a wrap-around metal finger that passes between a first edge of the solar cell and at least one contact pads. A photovoltaic (PV) string including a solar cell with a wrap-around metal contact finger. A method of coupling an electrically conductive connector to a solar cell with a wrap-around metal contact finger.
    Type: Application
    Filed: September 27, 2019
    Publication date: April 2, 2020
    Inventors: Matthieu Minault Reich, Lewis C. Abra, David Fredric Joel Kavulak, Andrea R. Bowring, Benjamin Francois, Peter J. Cousins, Boris Bastien, Benjamin I. Hsia, Raphael M. Manalo
  • Publication number: 20190301047
    Abstract: A wafer plating fixture for use in simultaneously electroplating a two substrates. The wafer plating fixture including: an electrically conductive carrier bus; a plurality of contact clips electrically coupled to the carrier bus and configured to hold the two substrates in place and electrically couple the two substrates to the carrier bus; and a non-conductive substrate backer to separate the two substrates coupled to the carrier bus. A method of electroplating a plurality of substrates. The method including: mounting two substrates to be plated onto a wafer plating fixture; mounting the wafer plating fixture on a continuous belt of plating system; dipping the wafer plating fixture with the two substrates held thereon into an electroplating bath; and applying a voltage to the two substrates via the wafer plating fixture.
    Type: Application
    Filed: March 7, 2019
    Publication date: October 3, 2019
    Inventors: Hung-Ming Wang, Paul W. Loscutoff, Raphael M. Manalo, Amold V. Castillo, Mohamad Ridzwan Mustafa, Mark A. Kleshock, Neil G. Bergstrom