Patents by Inventor Raphael Mitchell

Raphael Mitchell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CMP slurry additive for foreign matter detection
    Patent number: 6857434
    Abstract: A method and structure polishes and cleans silicon wafers by mixing a marker with a slurry to form a slurry mixture, performs chemical mechanical polishing on a silicon wafer using the slurry mixture, rinses the slurry mixture from the silicon wafer, checks the silicon wafer for marker residue, and repeats the rinsing process if the checking process detects the marker residue on the wafer.
    Type: Grant
    Filed: January 24, 2002
    Date of Patent: February 22, 2005
    Assignee: International Business Machines Corporation
    Inventors: Kwong Hon Wong, Karl E. Boggs, Raphael Mitchell, Uldis A. Ziemins
  • CMP slurry additive for foreign matter detection
    Publication number: 20030139048
    Abstract: A method and structure polishes and cleans silicon wafers by mixing a marker with a slurry to form a slurry mixture, performs chemical mechanical polishing on a silicon wafer using the slurry mixture, rinses the slurry mixture from the silicon wafer, checks the silicon wafer for marker residue, and repeats the rinsing process if the checking process detects the marker residue on the wafer.
    Type: Application
    Filed: January 24, 2002
    Publication date: July 24, 2003
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Kwong Hon Wong, Karl E. Boggs, Raphael Mitchell, Uldis A. Ziemins