Patents by Inventor Raphael Nico Johan STEGEN

Raphael Nico Johan STEGEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11809086
    Abstract: A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure comprising an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and an inner part and an outer part; wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.
    Type: Grant
    Filed: October 15, 2021
    Date of Patent: November 7, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raphael Nico Johan Stegen, Giovanni Luca Gattobigio, Theodorus Wilhelmus Polet
  • Patent number: 11720032
    Abstract: A process tool for processing production substrates, the process tool including: a movable stage configured to perform long-stroke movements in an X-Y plane; an imaging device mounted to a fixed part of the tool and having an optical axis substantially parallel to the X-Y plane; and a mirror mounted on the movable stage and oriented at a predetermined angle of inclination to the X-Y plane so that by moving the movable stage to a predetermined position a part of a component to be inspected can be imaged by the imaging device.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: August 8, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raphael Nico Johan Stegen, Erik Henricus Egidius Catharina Eummelen, Christianus Wilhelmus Johannes Berendsen, Theodorus Wilhelmus Polet, Giovanni Luca Gattobigio
  • Publication number: 20220035254
    Abstract: A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure comprising an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and an inner part and an outer part; wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.
    Type: Application
    Filed: October 15, 2021
    Publication date: February 3, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raphael Nico Johan STEGEN, Giovanni Luca GATTOBIGIO, Theodorus Wilhelmus POLET
  • Publication number: 20210349397
    Abstract: A process tool for processing production substrates, the process tool including: a movable stage configured to perform long-stroke movements in an X-Y plane; an imaging device mounted to a fixed part of the tool and having an optical axis substantially parallel to the X-Y plane; and a mirror mounted on the movable stage and oriented at a predetermined angle of inclination to the X-Y plane so that by moving the movable stage to a predetermined position a part of a component to be inspected can be imaged by the imaging device.
    Type: Application
    Filed: August 30, 2019
    Publication date: November 11, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raphael Nico Johan STEGEN, Erik Henricus Egidius Catharina EUMMELEN, Christianus Wilhelmus Johannes BERENDSEN, Theodorus Wilhelmus POLET, Giovanni Luca GATTOBIGIO
  • Patent number: 11156921
    Abstract: A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure having an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and having an inner part and an outer part, wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.
    Type: Grant
    Filed: November 22, 2018
    Date of Patent: October 26, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raphael Nico Johan Stegen, Giovanni Luca Gattobigio, Theodorus Wilhelmus Polet
  • Publication number: 20210191275
    Abstract: A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure having an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and having an inner part and an outer part, wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.
    Type: Application
    Filed: November 22, 2018
    Publication date: June 24, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raphael Nico Johan STEGEN, Giovanni Luca GATTOBIGIO, Theodorus Wilhelmus POLET