Abstract: The present invention relates to antimicrobial compositions comprising surfactants and organic and/or inorganic acids wherein the compositions and/or the surfactant and acid combination meet specific functional criteria. Articles of manufacture and methods of cleansing the skin using the described compositions are also disclosed.

Abstract: The preset invention relates to personal care compositions comprising from about 0.5% to about 80% of a surfactant, from about 0.1% to about 12% of a polymeric acid; and from about 3% to about 98.899% of water, wherein the composition is adjusted to a pH of from about 3.0 to about 6.0.

Abstract: The present invention relates to a leave-on antimicrobial composition comprising from about 0.001% to about 5% of an antimicrobial active; from about 0.05% to about 10% of an anionic surfactant; from about 0.1% to about 10% of a proton donating agent; and from about 0% to about 99.85% of water; wherein the composition is adjusted to a pH of from about 3.0 to about 6.0; wherein the leave-on antimicrobial composition has a Gram Positive Residual Effectiveness Index of greater than about 0.5; and wherein the leave-on antimicrobial composition has a Mildness Index of greater than 0.3. The invention also encompasses methods for cleansing skin and providing residual effectiveness versus Gram positive bacteria using these products.

Abstract: The present invention relates to an antimicrobial wipe comprising a porous or absorbent sheet impregnated with an antimicrobial cleansing composition, wherein the antimicrobial cleansing composition comprises from about 0.001% to about 5.0%, by weight of the antimicrobial cleansing composition, of an antimicrobial active; from about 0.05% to about 10%, by weight of the antimicrobial cleansing composition, of an anionic surfactant; from about 0.1% to about 10%, by weight of the antimicrobial cleansing composition, of a proton donating agent; and from about 3% to about 99.85%, by weight of the antimicrobial cleansing composition, water; wherein the composition is adjusted to a pH of from about 3.0 to about 6.0; wherein the antimicrobial cleansing composition has a Gram Positive Residual Effectiveness Index of greater than about 0.5; and wherein the antimicrobial cleansing composition has a Mildness Index of less than about 0.3.

Abstract: The present invention relates to personal care compositions comprising from about 0.5% to about 80% of a surfactant, from about 0.1% to about 12% of a polymeric acid; and from about 3% to about 98.899% of water, wherein the composition is adjusted to a pH of from about 3.0 to about 6.0.

Abstract: The present invention relates to a rinse-off antimicrobial cleansing composition comprising from about 0.001% to about 5% of an antimicrobial active, from about 1% to about 80% of an anionic surfactant, from about 0.1% to about 12% of a proton donating agent; from about 0.1% to about 30% of a deposition aid; and from about 3% to about 98.8% of water, wherein the composition is adjusted to a pH of from about 3.0 to about 6.0, wherein the rinse-off antimicrobial cleansing composition has a Gram Negative Residual Effectiveness Index of greater than about 0.3, and wherein the rinse-off antimicrobial cleansing composition has a Mildness Index of greater than 0.3. The invention also encompasses methods for cleansing skin and providing residual effectiveness versus Gram negative bacteria using these products.

Abstract: The present invention relates to a rinse-off antimicrobial cleansing composition comprising from about 0.001% to about 5% of an antimicrobial active, from about 1% to about 80% of an anionic surfactant, from about 0.1% to about 12% of a proton donating agent; and from about 3% to about 98.899% of water, wherein the composition is adjusted to a pH of from about 3.0 to about 6.0, wherein the rinse-off antimicrobial cleansing composition has a Gram Positive Residual Effectiveness Index of greater than about 1.8, and wherein the rinse-off antimicrobial cleansing composition has a Mildness Index of greater than 0.3. The invention also encompasses methods for cleansing skin and providing residual effectiveness versus Gram positive bacteria using these products.

Abstract: The subject invention relates to methods for sebum control and treatment of acne in mammalian skin and scalp comprising administration of hesperetin, having the structure: ##STR1## or a pharmaceutically-acceptable salt thereof.

Abstract: The present invention relates to the compound cyproterone thiopivalate (CTP) and compositions comprising CTP. The present invention further relates to methods of treating acne and/or sebaceous gland activity comprising topical application of CTP. The present invention additionally relates to methods of regulating hair growth comprising application of compositions comprising CTP.

Abstract: The present invention relates to the compound cyproterone acetate thioacetate (CATA) and compositions comprising CATA. The present invention further relates to methods of treating acne and/or sebaceous gland activity comprising topical application of CATA. The present invention additionally relates to methods of regulating hair growth comprising application of compositions comprising CATA.

Abstract: The present invention relates to a composition for regulating hair growth comprising a safe and effective amount of the tripeptide histidyl-glycyl-glycine, or a derivative thereof, and a pharmaceutically-acceptable carrier.

Abstract: The present invention relates to a composition for regulating hair growth comprising a safe and effective amount of a supernatant derived from a culture of epithelial cells which comprises a growth stimulating factor with characteristics of mitogenicity to dermal papilla cells, mitogenicity to 3T3 cells, lack of mitogenicity to epidermal cells, and a molecular weight of greater than about 3,000D; and a pharmaceutically-acceptable carrier.