Patents by Inventor Raquel Terroba

Raquel Terroba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for the formation of polyhedral oligomeric silsesquioxanes
    Patent number: 6972312
    Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]??, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]28 where ?=1-1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.
    Type: Grant
    Filed: August 4, 2000
    Date of Patent: December 6, 2005
    Assignee: Hybrid Plastics LLC
    Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zong An, William Reinerth, Michael J. Carr, Frank J. Feher, Raquel Terroba, Qibo Liu
  • Process for the formation of polyhedral oligomeric silsesquioxanes
    Publication number: 20050239985
    Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]?, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]? where ?=1?1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n]?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.
    Type: Application
    Filed: June 24, 2005
    Publication date: October 27, 2005
    Applicant: Hybrid Plastics LLC
    Inventors: Joseph Lichtenhan, Joseph Schwab, Yi-Zong An, William Reinerth, Michael Carr, Frank Feher, Raquel Terroba