Patents by Inventor Ratnasabapathy Sooriyakumaran

Ratnasabapathy Sooriyakumaran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mid and deep-uv antireflection coatings and methods for use thereof
    Patent number: 5482817
    Abstract: An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: September 29, 1994
    Date of Patent: January 9, 1996
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Mid and deep-UV antireflection coatings and methods for use thereof
    Patent number: 5380621
    Abstract: An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: May 3, 1993
    Date of Patent: January 10, 1995
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood