Patents by Inventor Raul Sharma

Raul Sharma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multilayer films and laminates containing slip agents
    Patent number: 11945194
    Abstract: The present disclosure provides a multilayer film. The multilayer film includes at least two layers including a sealant layer and a second layer in contact with the sealant layer. The sealant layer contains (A) a first ethylene-based polymer having a density from 0.895 g/cc to 0.925 g/cc and a melt index from 0.5 g/10 min to 30 g/10 min; (B) a branched fatty acid amide; and (C) a linear saturated fatty acid amide, wherein the branched fatty acid amide and the linear saturated fatty acid amide have a weight ratio of from 1:5 to 3:1. The second layer contains a second ethylene-based polymer.
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: April 2, 2024
    Assignees: Dow Global Technologies LLC, Rohm and Haas Company
    Inventors: Ronald Wevers, Raul Sharma, Kyle E. Hart, Mridula Kapur, Michaeleen L. Pacholski
  • Multilayer Films and Laminates Containing Slip Agents
    Publication number: 20220105712
    Abstract: The present disclosure provides a multilayer film. The multilayer film includes at least two layers including a sealant layer and a second layer in contact with the sealant layer. The sealant layer contains (A) a first ethylene-based polymer having a density from 0.895 g/cc to 0.925 g/cc and a melt index from 0.5 g/10 min to 30 g/10 min; (B) a branched fatty acid amide; and (C) a linear saturated fatty acid amide, wherein the branched fatty acid amide and the linear saturated fatty acid amide have a weight ratio of from 1:5 to 3:1. The second layer contains a second ethylene-based polymer.
    Type: Application
    Filed: December 10, 2019
    Publication date: April 7, 2022
    Inventors: Ronald Wevers, Raul Sharma, Kyle E. Hart, Mridula Kapur, Michaeleen L. Pacholski