Patents by Inventor Raul Vyas

Raul Vyas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EDGE RINGS FOR IMPROVED EDGED UNIFORMITY IN SEMICONDUCTOR PROCESSING OPERATIONS
    Publication number: 20250014938
    Abstract: Improved edge rings with flow conductance features are disclosed. The flow conductance features of the edge ring are features added to the edge ring that adjust the flow conductance of gas flowing in the local area of the edge ring. The flow conductance features can adjust the flow conductance to compensate for features on a semiconductor wafer, the edge ring, and in the chamber that may affect the flow of gas in the local areas. The flow conductance may be increased, reduced, or tuned depending on the desired effect.
    Type: Application
    Filed: November 21, 2022
    Publication date: January 9, 2025
    Inventors: Anand Chandrashekar, Leonard Wai Fung Kho, Son Vo Nam Tran, Jared Ahmad Lee, Raul Vyas, Gang L. Liu, Jasmine Lin