Patents by Inventor Ravi Chaitanya KALLURI

Ravi Chaitanya KALLURI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CONTAMINANT IDENTIFICATION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
    Publication number: 20230142459
    Abstract: An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illumination system generates a first illumination beam (1610) at a first wavelength and a second illumination beam (1618) at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object (1612) simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation (1620) scattered by a particle (1624) present at a surface (1626) of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.
    Type: Application
    Filed: April 8, 2021
    Publication date: May 11, 2023
    Applicant: ASML Holding N.V.
    Inventors: Andrew JUDGE, Ravi Chaitanya KALLURI, Michal Emanuel PAWLOWSKI, James Hamilton WALSH, Justin Lloyd KREUZER