Patents by Inventor Ravi T. Iyer

Ravi T. Iyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chamber and cleaning process therefor
    Patent number: 6201219
    Abstract: A modified processing chamber is disclosed and a process for selectively cleaning the processing chamber by applying energy in a temperature pattern to surfaces of the processing chamber which receive deposits as a result of prior operations conducted within the processing chamber. The processing chamber is cleaned by ion bombardment with heat driven plasma cleaning which is selective to the heated portions of the processing chamber. Also disclosed are various embodiments for applying the temperature pattern to surfaces of the processing chamber, including the use of combustion flames or heat lamps which are positioned to heat surfaces which are to be cleaned. Another embodiment comprises the use of heating elements embedded in the surfaces to be cleaned, and yet another embodiment comprises a susceptor which is heated and radiates heat onto the surfaces to be cleaned.
    Type: Grant
    Filed: February 25, 1998
    Date of Patent: March 13, 2001
    Assignee: Micron Technology, Inc.
    Inventors: Gurtej S. Sandhu, Ravi T. Iyer, Donald L. Westmoreland