Abstract: This disclosure describes a memory cell array with enhanced read sensing margin. The memory cell array includes a write port and a read port being connected through first and second data storage lines. The memory cell array further includes multiple word lines and bit lines arranged in rows and columns such that the read port is coupled to a read word line, a read bit line, and a virtual ground. The read port includes a first transistor coupled to at least the read bit line and the virtual ground, a second transistor coupled to at least the first data storage line and the first transistor, a third transistor coupled to at least the second data storage line and the read word line, and a fourth transistor coupled at least the first data storage line and the read word line.

Abstract: This disclosure describes a memory cell array with enhanced read sensing margin. The memory cell array includes a write port and a read port being connected through first and second data storage lines. The memory cell array further includes multiple word lines and bit lines arranged in rows and columns such that the read port is coupled to a read word line, a read bit line, and a virtual ground. The read port includes a first transistor coupled to at least the read bit line and the virtual ground, a second transistor coupled to at least the first data storage line and the first transistor, a third transistor coupled to at least the second data storage line and the read word line, and a fourth transistor coupled at least the first data storage line and the read word line.

Abstract: PMOS-based temperature compensated read-assist circuits for low-Vmin 6T SRAM bitcells realized in nanometer scale (e.g., 7 nm) CMOS FinFET technologies generate maximum wordline lowering (lower wordline voltages) at higher temperatures and minimum wordline lowering (higher wordline voltages) at lower operating temperatures in way that is substantially process independent and avoids post-silicon tuning. A read-assist PMOS transistor is connected between an associated wordline and VSS and controlled by a temperature compensation signal produced at an intermediate node between weak pull-up and strong pull-down PMOS transistors that are connected in series between VDD and VSS and respectively controlled by VDD and VSS during read operations. This configuration generates the temperature compensation signal at a level closer to VSS at high temperatures than at low temperatures, whereby write-ability is not impacted by the read-assist circuit at low temperature.

Abstract: PMOS-based temperature compensated read-assist circuits for low-Vmin 6T SRAM bitcells realized in nanometer scale (e.g., 7 nm) CMOS FinFET technologies generate maximum wordline lowering (lower wordline voltages) at higher temperatures and minimum wordline lowering (higher wordline voltages) at lower operating temperatures in way that is substantially process independent and avoids post-silicon tuning. A read-assist PMOS transistor is connected between an associated wordline and VSS and controlled by a temperature compensation signal produced at an intermediate node between weak pull-up and strong pull-down PMOS transistors that are connected in series between VDD and VSS and respectively controlled by VDD and VSS during read operations. This configuration generates the temperature compensation signal at a level closer to VSS at high temperatures than at low temperatures, whereby write-ability is not impacted by the read-assist circuit at low temperature.