Patents by Inventor Ravindra Upadhye

Ravindra Upadhye has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060188703
    Abstract: An automated process that can produce targets of any density gradient along an axial and a radial coordinate is explored. Such an approach is based on the observation that particles of different size, shape and density settle in fluid-filled columns differently. The invention presents models and procedures to automate the process so as to obtain any combination of density gradients.
    Type: Application
    Filed: February 22, 2005
    Publication date: August 24, 2006
    Inventor: Ravindra Upadhye
  • Publication number: 20060057450
    Abstract: A microreactor comprising a silicon wafer, a multiplicity of microchannels in the silicon wafer, and a catalyst coating the microchannels. In one embodiment the catalyst coating the microchannels comprises a nanostructured material. In another embodiment the catalyst coating the microchannels comprises an aerogel. In another embodiment the catalyst coating the microchannels comprises a solgel. In another embodiment the catalyst coating the microchannels comprises carbon nanotubes.
    Type: Application
    Filed: April 28, 2005
    Publication date: March 16, 2006
    Inventors: Jeffrey Morse, David Sopchak, Ravindra Upadhye, John Reynolds, Joe Satcher, Alex Gash
  • Publication number: 20050260485
    Abstract: A phosphoric acid fuel cell system comprising a porous electrolyte support, a phosphoric acid electrolyte in the porous electrolyte support, a cathode electrode contacting the phosphoric acid electrolyte, and an anode electrode contacting the phosphoric acid electrolyte.
    Type: Application
    Filed: April 28, 2005
    Publication date: November 24, 2005
    Inventors: David Sopchak, Jeffrey Morse, Ravindra Upadhye, Jack Kotovsky, Robert Graff
  • Publication number: 20050207953
    Abstract: A chemical microreactor with a high aspect ratio. In one embodiment the chemical microreactor has a chemical microreactor section with channels having a height and with spacings having a width. There is a high aspect ratio of the height to the width. The high aspect ratio in one embodiment is more than substantially 5:1. The high aspect ratio in another embodiment is more than substantially 10:1. The high aspect ratio another embodiment is more than substantially 15:1. The high aspect ratio in one embodiment is substantially 20:1.
    Type: Application
    Filed: July 20, 2004
    Publication date: September 22, 2005
    Inventors: Ravindra Upadhye, Jeffrey Morse, David Sopchak, Mark Havstad, Robert Graff