Abstract: The subject application relates to metrology targets with filling elements that reduce inaccuracies and maintain contrast. The present invention provides a metrology target and a method to design the metrology target. The metrology target comprises specified filling elements introduced into identified continuous regions in a given target design, wherein parameters of the introduced filling elements are determined by a trade-off between a contrast requirement and an inaccuracy requirement which is associated via production with the identified continuous regions. The method includes the steps of identifying continuous regions in a target design, and introducing specified filling elements into the identified continuous regions, wherein parameters of the introduced filling elements are determined by a trade-off between a contrast requirement and an inaccuracy requirement which is associated via production with the identifying continuous regions.

Abstract: Imaging metrology targets and methods are provided, which combine one-dimensional (1D) elements designed to provide 1D imaging metrology signals along at least two measurement directions and two-dimensional (2D) elements designed to provide at least one 2D imaging metrology overlay signal. The target area of the 1D elements may enclose the 2D elements or the target areas of the 1D and 2D elements may be partially or fully congruent. The compound targets are small, possible multilayered, and may be designed to be process compatible (e.g., by segmentation of the elements, interspaces between elements and element backgrounds) and possibly be produced in die. 2D elements may be designed to periodic to provide additional one dimensional metrology signals.

Abstract: Methods and respective modules are provided, configured to identify registration errors of DSA lines with respect to guiding lines in a produced structure, by comparing a measured signature of the structure with simulated signatures corresponding to simulated structures having varying simulated characteristics, and characterizing the produced structure according to the comparison. The characterization may be carried out using electromagnetic characterization of a geometric model or in a model-free manner by analyzing model-based results. Thus, for the first time, positioning and dimensional errors of DSA lines may be measured.

Abstract: Target designs methods and targets are provided, in which at least some of the differentiation between target elements and their background is carried out by segmenting either of them. Directed self-assembly (DSA) processes are used to generate fine segmentation, and various characteristics of the polymer lines and their guiding lines are used to differentiate target elements from their background. Target designs and design principles are disclosed in relation to the DSA process, as well as optimization of the DSA process to yield high metrology measurement accuracy in face of production inaccuracies. Furthermore, designs and methods are provided for enhancing and using ordered regions of a DSA-produced polymer surface as target elements and as hard masks for production processes. The targets and methods may be configured to enable metrology measurements using polarized light to distinguish target elements or DSA features.

Abstract: The subject application relates to metrology targets with filling elements that reduce inaccuracies and maintain contrast. The present invention provides a metrology target and a method to design the metrology target. The metrology target comprises specified filling elements introduced into identified continuous regions in a given target design, wherein parameters of the introduced filling elements are determined by a trade-off between a contrast requirement and an inaccuracy requirement which is associated via production with the identified continuous regions. The method includes the steps of identifying continuous regions in a target design, and, introducing specified filling elements into the identified continuous regions, wherein parameters of the introduced filling elements are determined by a trade-off between a contrast requirement and an inaccuracy requirement which is associated via production with the identifying continuous regions.

Abstract: Metrology targets, design files, and design and production methods thereof are provided. The targets comprise two or more parallel periodic structures at respective layers, wherein a predetermined offset is introduced between the periodic structures, for example, opposite offsets at different parts of a target. Quality metrics are designed to estimate the unintentional overlay from measurements of a same metrology parameter by two or more alternative measurement algorithms. Target parameters are configured to enable both imaging and scatterometry measurements and enhance the metrology measurements by the use of both methods on the same targets. Imaging and scatterometry target parts may share elements or have common element dimensions. Imaging and scatterometry target parts may be combined into a single target area or may be integrated into a hybrid target using a specified geometric arrangement.