Patents by Inventor Rawi Dirawi

Rawi Dirawi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composite overlay metrology target
    Patent number: 11809090
    Abstract: A metrology target includes a first set of pattern elements compatible with a first metrology mode along one or more directions, and a second set of pattern elements compatible with a second metrology mode along one or more directions, wherein the second set of pattern elements includes a first portion of the first set of pattern elements, and wherein the second set of pattern elements is surrounded by a second portion of the first set of pattern elements not included in the second set of pattern elements.
    Type: Grant
    Filed: August 18, 2020
    Date of Patent: November 7, 2023
    Assignee: KLA Corporation
    Inventors: Anna Golotsvan, Inna Steely-Tarshish, Mark Ghinovker, Rawi Dirawi
  • System and method for error reduction for metrology measurements
    Patent number: 11353799
    Abstract: A metrology system includes a controller communicatively coupled to one or more metrology tools, the controller including one or more processors configured to execute program instructions causing the one or more processors to receive one or more metrology measurements of one or more metrology targets of a metrology sample, a metrology target of the one or more metrology targets including one or more target designs with one or more cells, the one or more target designs being generated on one or more layers of the metrology sample; determine one or more errors based on the one or more metrology measurements; and determine one or more correctables to adjust one or more sources of error corresponding to the one or more errors, the one or more correctables being configured to reduce an amount of noise in the one or more metrology measurements generated by the one or more sources of errors.
    Type: Grant
    Filed: July 14, 2020
    Date of Patent: June 7, 2022
    Inventors: Roie Volkovich, Liran Yerushalmi, Anna Golotsvan, Rawi Dirawi, Chen Dror, Nir BenDavid, Amnon Manassen, Oren Lahav, Shlomit Katz
  • System and Method for Error Reduction for Metrology Measurements
    Publication number: 20220155693
    Abstract: A metrology system includes a controller communicatively coupled to one or more metrology tools, the controller including one or more processors configured to execute program instructions causing the one or more processors to receive one or more metrology measurements of one or more metrology targets of a metrology sample, a metrology target of the one or more metrology targets including one or more target designs with one or more cells, the one or more target designs being generated on one or more layers of the metrology sample; determine one or more errors based on the one or more metrology measurements; and determine one or more correctables to adjust one or more sources of error corresponding to the one or more errors, the one or more correctables being configured to reduce an amount of noise in the one or more metrology measurements generated by the one or more sources of errors.
    Type: Application
    Filed: July 14, 2020
    Publication date: May 19, 2022
    Inventors: Roie Volkovich, Liran Yerushalmi, Anna Golotsvan, Rawi Dirawi, Chen Dror, Nir BenDavid, Amnon Manassen, Oren Lahav, Shlomit Katz
  • COMPOSITE OVERLAY METROLOGY TARGET
    Publication number: 20210240089
    Abstract: A metrology target includes a first set of pattern elements compatible with a first metrology mode along one or more directions, and a second set of pattern elements compatible with a second metrology mode along one or more directions, wherein the second set of pattern elements includes a first portion of the first set of pattern elements, and wherein the second set of pattern elements is surrounded by a second portion of the first set of pattern elements not included in the second set of pattern elements.
    Type: Application
    Filed: August 18, 2020
    Publication date: August 5, 2021
    Applicant: KLA Corporation
    Inventors: Anna Golotsvan, Inna Tarshish-Shapir, Mark Ghinovker, Rawi Dirawi