Patents by Inventor Ray Rudi Rayniak

Ray Rudi Rayniak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Automated particle monitor for a thin film process
    Patent number: 6032544
    Abstract: A method of calibrating a particle monitor prior to applying DC power to a cathode in the processing chamber by first, initiating a flow of gas to the processing chamber. Next, the operation of the particle monitor is initiated to obtain a particle count within the flow of gas in the processing chamber. If the particle monitor detects a particle count in excess of a minimum value, the operation of the particle monitor is adjusted to reduce the particle count to the minimum value. During production, the particle monitor count is initiated by a particle monitor control only after the particle monitor control detects an occurrence of both a first signal generated in response to initiating a flow of gas to the processing chamber and, a second signal generated in response to the application of power to a cathode within the processing chamber.
    Type: Grant
    Filed: June 3, 1999
    Date of Patent: March 7, 2000
    Assignees: Sony Corporation, Sony Electronics Inc.
    Inventors: Cheryl Diane Harwell, Ray Rudi Rayniak
  • Automated particle monitor operation for a thin film process
    Patent number: 5942672
    Abstract: A method of calibrating a particle monitor prior to applying DC power to a cathode in the processing chamber by first, initiating a flow of gas to the processing chamber. Next, the operation of the particle monitor is initiated to obtain a particle count within the flow of gas in the processing chamber. If the particle monitor detects a particle count in excess of a minimum value, the operation of the particle monitor is adjusted to reduce the particle count to the minimum value. During production, the particle monitor count is initiated by a particle monitor control only after the particle monitor control detects an occurrence of both a first signal generated in response to initiating a flow of gas to the processing chamber and, a second signal generated in response to the application of power to a cathode within the processing chamber.
    Type: Grant
    Filed: September 4, 1997
    Date of Patent: August 24, 1999
    Assignees: Sony Corporation, Sony Electronics Inc.
    Inventors: Cheryl Diane Harwell, Ray Rudi Rayniak