Patents by Inventor RAYMOND A. WEITEKAMP
RAYMOND A. WEITEKAMP has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240368338Abstract: Described herein, in part, are compositions and methods for processing and curing photopolymer composition based on olefin matathesis. The photopolymer composition comprises a latent ruthenium (Ru) complex, an initiator and at least one polymer precursor. A method for preparing a cured photopolymer composition comprises exposing the photopolymer composition to electromagnetic radiation above a threshold energy to activate the initiator and exposing the photopolymer to electromagnetic radiation below said threshold energy, thereby preparing the cured photopolymer composition.Type: ApplicationFiled: August 17, 2022Publication date: November 7, 2024Inventors: Raymond A. Weitekamp, Aditya Balasubramanian, Charles Friesen
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Patent number: 12036078Abstract: The present disclosure relates to a method for generating a dental product or an orthodontic product. The method may comprise (a) providing a mixture comprising (i) a latent ruthenium (Ru) complex; (ii) an initiator; (iii) a sensitizer that sensitizes said initiator; and (iv) at least one polymer precursor; and (b) exposing the mixture to electromagnetic radiation to activate the initiator, wherein upon activation, the initiator reacts with the latent Ru complex to generate an activated Ru complex, which activated Ru complex reacts with the at least one polymer precursor to generate at least a portion of a final product of the dental product or the orthodontic product, wherein the at least the portion of the final product of the dental product or the orthodontic product comprises a polymer generated from the at least one polymer precursor.Type: GrantFiled: August 11, 2021Date of Patent: July 16, 2024Assignee: POLYSPECTRA, INC.Inventors: Raymond A. Weitekamp, Aditya Balasubramanian
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Publication number: 20230391945Abstract: Described herein are compositions and methods for processing photopolymers based on olefin metathesis. The compositions and methods comprise latent ruthenium complexes and photoacids and/or photoacid generators.Type: ApplicationFiled: May 25, 2023Publication date: December 7, 2023Inventors: Aditya BALASUBRAMANIAN, Raymond A. WEITEKAMP
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Patent number: 11725077Abstract: Described herein are compositions and methods for processing photopolymers based on olefin metathesis. The compositions and methods comprise latent ruthenium complexes and photoacids and/or photoacid generators.Type: GrantFiled: October 14, 2020Date of Patent: August 15, 2023Assignee: POLYSPECTRA, INC.Inventors: Aditya Balasubramanian, Raymond A. Weitekamp
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Publication number: 20220110728Abstract: Described herein are compositions and methods for generating dental products or orthodontic products. The compositions and methods comprise latent ruthenium complexes and photoacids and/or photoacid generators.Type: ApplicationFiled: August 11, 2021Publication date: April 14, 2022Inventors: Raymond A. Weitekamp, Aditya Balasubramanian
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Publication number: 20210163676Abstract: Described herein are compositions and methods for processing photopolymers based on olefin metathesis. The compositions and methods comprise latent ruthenium complexes and photoacids and/or photoacid generators.Type: ApplicationFiled: October 14, 2020Publication date: June 3, 2021Inventors: Aditya BALASUBRAMANIAN, Raymond A. WEITEKAMP
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Patent number: 10799613Abstract: The present invention relates to methods of metathesizing olefins using catalysts previously considered to be practically inactive. The present invention further relates to novel photosensitive compositions, their use as photoresists, and methods related to patterning polymer layers on substrates. Further, modifications to the compositions and method provide for an unprecedented functionalization of the compositions, useful for example in the preparation of sensors, drug delivery systems, and tissue scaffolds. The novel compositions and associated methods also provide for the opportunity to prepare 3-dimensional objects which provide new access to critically dimensioned devices, including for example photonic devices.Type: GrantFiled: October 3, 2014Date of Patent: October 13, 2020Assignee: California Institute of TechnologyInventors: Raymond Weitekamp, Robert H. Grubbs, Harry A. Atwater, James Fakonas
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Patent number: 10732321Abstract: The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.Type: GrantFiled: August 22, 2016Date of Patent: August 4, 2020Assignee: California Institute of TechnologyInventors: Garret M. Miyake, Raymond Weitekamp, Robert H. Grubbs, Victoria Piunova
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Publication number: 20200183276Abstract: The present disclosure is directed to photosensitive compositions ‘Fischer-type’ ruthenium carbene catalysts containing chelated 2,2?-bipyridine ligands and methods of using the same. These catalysts are surprisingly active even when using relatively low intensity diode light sources. The 2,2?-bipyridine-chelated ruthenium photocatalysts show reactivity at substantially lower exposure levels than other photoactive chelating dinitrogen ligands of similar structure. The present disclosure is further directed to novel photosensitive compositions, their use as photoresists, and methods related to patterning polymer layers on substrates.Type: ApplicationFiled: February 7, 2020Publication date: June 11, 2020Inventor: Raymond A. Weitekamp
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Patent number: 10170718Abstract: The devices can be fabricated by a method that permits active polymer chains to be polymerized on the surface of an electrode such that the active polymer chains are aligned with one another. The active polymer chains can also be covalently linked to a second electrode so the active polymer chains are located in an active layer of the device. The polymerization method can be paused and resumed at any point in the polymerization so nanoparticles can be added into the active layer. Additionally, the polymerization method allows that active polymer chains to be polymerized so they include junctions such as p-n junctions and Schottky junctions.Type: GrantFiled: May 29, 2015Date of Patent: January 1, 2019Assignee: The California Institute of TechnologyInventor: Raymond Weitekamp
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Patent number: 10081705Abstract: The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers.Type: GrantFiled: April 28, 2015Date of Patent: September 25, 2018Assignee: California Institute of TechnologyInventors: Yan Xia, Benjamin R. Sveinbjornsson, Robert H. Grubbs, Raymond Weitekamp, Garret M. Miyake, Victoria Piunova, Christopher Scot Daeffler
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Publication number: 20180067393Abstract: The present disclosure is directed to photosensitive compositions ‘Fischer-type’ ruthenium carbene catalysts containing chelated 2,2?-bipyridine ligands and methods of using the same. These catalysts are surprisingly active even when using relatively low intensity diode light sources. The 2,2?-bipyridine-chelated ruthenium photocatalysts show reactivity at substantially lower exposure levels than other photoactive chelating dinitrogen ligands of similar structure. The present disclosure is further directed to novel photosensitive compositions, their use as photoresists, and methods related to patterning polymer layers on substrates.Type: ApplicationFiled: August 31, 2017Publication date: March 8, 2018Inventor: RAYMOND A. WEITEKAMP
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Patent number: 9776242Abstract: The present disclosure is directed to processes comprising irradiating an aggregate of chemically bonded or otherwise associated nanoparticles with a light source capable of providing multiphoton excitation, the light source directed at a focal point volume including the aggregate and having sufficient energy to disrupt or fuse the aggregate within the focal point volume to form nanoscale deposits of the nanoparticles.Type: GrantFiled: March 16, 2016Date of Patent: October 3, 2017Assignees: California Institute of Technology, City of HopeInventors: Raymond Weitekamp, Krishnan Thyagarajan, Jacob Berlin, Desiree Van Haute
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Patent number: 9593425Abstract: A CO2 reduction electrode includes an active layer on an electrode base. The active layer includes a polymer that includes one or more reaction components selected from a group consisting of a CO2 reduction catalyst and an activator that bonds CO2 so as to form a CO2 reduction intermediate.Type: GrantFiled: January 22, 2015Date of Patent: March 14, 2017Assignee: California Institute of TechnologyInventors: Oana R. Luca, Raymond Weitekamp, Robert H. Grubbs, Harry A. Atwater, Slobodan Mitrovic
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Patent number: 9573125Abstract: An efficient method for the preparation of backbone-substituted imidazolinium salts for use as N-heterocyclic carbene ligands, e.g., for organometallic catalysts is provided. These functionalized N-heterocyclic carbene ligands are used to prepare solid-supported catalysts, e.g., for olefin metathesis.Type: GrantFiled: June 26, 2013Date of Patent: February 21, 2017Assignee: California Institute of TechnologyInventors: Raymond Weitekamp, Robert H. Grubbs
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Patent number: 9575212Abstract: Described herein are copolymers constructed from chiral, non-racemic monomers, which self-assemble to photonic crystals. The difficulty of incorporating chiral elements into photonic crystals has limited the ability to generate unique bandstructures for different circular polarizations of light. The materials and methods described herein relate to easily, predictably fabricating chiral photonic crystals having desirable optical properties.Type: GrantFiled: February 25, 2014Date of Patent: February 21, 2017Assignee: California Institute of TechnologyInventors: Robert H. Grubbs, Garret M. Miyake, Raymond Weitekamp, Victoria Piunova
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Publication number: 20160356923Abstract: The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.Type: ApplicationFiled: August 22, 2016Publication date: December 8, 2016Applicant: California Institute of TechnologyInventors: Garret M. MIYAKE, Raymond WEITEKAMP, Robert H. GRUBBS, Victoria PIUNOVA
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Patent number: 9453943Abstract: The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.Type: GrantFiled: June 28, 2013Date of Patent: September 27, 2016Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGYInventors: Garret M Miyake, Raymond Weitekamp, Robert H Grubbs, Victoria Piunova
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Publication number: 20160271694Abstract: The present disclosure is directed to processes comprising irradiating an aggregate of chemically bonded or otherwise associated nanoparticles with a light source capable of providing multiphoton excitation, the light source directed to a focal point volume including the aggregate and having sufficient energy to disrupt or fuse the aggregate within the focal point volume to form nanoscale deposits of the nanoparticles.Type: ApplicationFiled: March 16, 2016Publication date: September 22, 2016Inventors: RAYMOND WEITEKAMP, KRISHNAN THYAGARAJAN, JACOB BERLIN, DESIREE VAN HAUTE
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Publication number: 20160226010Abstract: The devices can be fabricated by a method that permits active polymer chains to be polymerized on the surface of an electrode such that the active polymer chains are aligned with one another. The active polymer chains can also be covalently linked to a second electrode so the active polymer chains are located in an active layer of the device. The polymerization method can be paused and resumed at any point in the polymerization so nanoparticles can be added into the active layer. Additionally, the polymerization method allows that active polymer chains to be polymerized so they include junctions such as p-n junctions and Schottky junctions.Type: ApplicationFiled: May 29, 2015Publication date: August 4, 2016Applicant: California Institute of TechnologyInventor: Raymond Weitekamp