Patents by Inventor Raymond Gerardus Marius Beeren

Raymond Gerardus Marius Beeren has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
    Patent number: 9013672
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: April 21, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
    Patent number: 8947629
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: February 3, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • CLEANING DEVICE AND A LITHOGRAPHIC APPARATUS CLEANING METHOD
    Publication number: 20110292359
    Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
    Type: Application
    Filed: August 4, 2011
    Publication date: December 1, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS CLEANING METHOD
    Publication number: 20110222034
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.
    Type: Application
    Filed: May 18, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Hans Jansen, Peter Franciscus Wanten, Johannes Wilhelmus Jacobus Leonardus Culjpers, Raymond Gerardus Marius Beeren
  • Lithographic apparatus and lithographic apparatus cleaning method
    Patent number: 7969548
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.
    Type: Grant
    Filed: May 22, 2006
    Date of Patent: June 28, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Hans Jansen, Peter Franciscus Wanten, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren
  • CLEANING DEVICE, A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS CLEANING METHOD
    Publication number: 20110069290
    Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.
    Type: Application
    Filed: December 1, 2010
    Publication date: March 24, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bauke JANSEN, Raymond Gerardus Marius Beeren, Anthonius Martinus, Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd
  • Cleaning device and a lithographic apparatus cleaning method
    Patent number: 7900641
    Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: March 8, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
    Patent number: 7866330
    Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: January 11, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Bauke Jansen, Raymond Gerardus Marius Beeren, Anthonius Martinus Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd
  • Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
    Patent number: 7841352
    Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: November 30, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Bauke Jansen, Raymond Gerardus Marius Beeren, Anthonius Martinus Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd
  • Cleaning device, a lithographic apparatus and a lithographic cleaning method
    Publication number: 20080284990
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
    Type: Application
    Filed: April 11, 2008
    Publication date: November 20, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • Cleaning device and a lithographic apparatus cleaning method
    Publication number: 20080271747
    Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
    Type: Application
    Filed: June 29, 2007
    Publication date: November 6, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
    Publication number: 20080273181
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
    Type: Application
    Filed: June 29, 2007
    Publication date: November 6, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
    Publication number: 20080271750
    Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.
    Type: Application
    Filed: June 29, 2007
    Publication date: November 6, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bauke Jansen, Raymond Gerardus Marius Beeren, Anthonius Martinus Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd
  • Lithographic apparatus and lithographic apparatus cleaning method
    Publication number: 20070285631
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.
    Type: Application
    Filed: May 22, 2006
    Publication date: December 13, 2007
    Applicant: ASML NETHERLAND B.V
    Inventors: Marco Koert Stavenga, Hans Jansen, Peter Franciscus Wanten, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren