Patents by Inventor Raymond Golingo
Raymond Golingo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240079151Abstract: Plasma processing systems and methods for fusion power applications are disclosed. The system can include a plasma confinement device including a reaction chamber; a plasma formation and injection device configured to form a source plasma outside the reaction chamber and inject the source plasma inside the reaction chamber; and a power supply configured to supply power to the plasma confinement device to apply a voltage across the reaction chamber to compress the source plasma into a Z-pinch plasma capable of sustaining fusion reactions. The plasma confinement device can include an inner electrode surrounded by an outer electrode to define therebetween an acceleration region of the reaction chamber. The outer electrode can extend beyond the inner electrode to define an assembly region of the reaction chamber. The source plasma can be injected in the acceleration region and flowed into the assembly region to be compressed into the Z-pinch plasma.Type: ApplicationFiled: December 10, 2021Publication date: March 7, 2024Applicant: FUSE ENERGY TECHNOLOGIES CORP.Inventors: Raymond GOLINGO, Jean-Christoph BTAICHE, Paul HARRIS, Ayan CHOUDHURY, Zahra SEIFOLLAHI MOGHADAM, Pierre TOCHON
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Publication number: 20230223158Abstract: An example method includes directing gas, via one or more first valves, from within an inner electrode to an acceleration region between the inner electrode and an outer electrode that substantially surrounds the inner electrode, directing gas, via two or more second valves, from outside the outer electrode to the acceleration region, and applying, via a power supply, a voltage between the inner electrode and the outer electrode, thereby converting at least a portion of the directed gas into a plasma having a substantially annular cross section, the plasma flowing axially within the acceleration region toward a first end of the inner electrode and a first end of the outer electrode and, thereafter, establishing a Z-pinch plasma that flows between the first end of the outer electrode and the first end of the inner electrode. Related plasma confinement systems and methods are also disclosed herein.Type: ApplicationFiled: January 5, 2023Publication date: July 13, 2023Inventors: Uri SHUMLAK, Brian A. NELSON, Raymond GOLINGO
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Patent number: 11581100Abstract: An example method includes directing gas, via one or more first valves, from within an inner electrode to an acceleration region between the inner electrode and an outer electrode that substantially surrounds the inner electrode, directing gas, via two or more second valves, from outside the outer electrode to the acceleration region, and applying, via a power supply, a voltage between the inner electrode and the outer electrode, thereby converting at least a portion of the directed gas into a plasma saving a substantially annular cross section, the plasma flowing axially within the acceleration region toward a first end of the inner electrode and a first end of the outer electrode and, thereafter, establishing a Z-pinch plasma that flows between the first end of the outer electrode and the first end of the inner electrode. Related plasma confinement systems and methods are also disclosed herein.Type: GrantFiled: February 23, 2018Date of Patent: February 14, 2023Assignee: University of WashingtonInventors: Uri Shumlak, Brian A. Nelson, Raymond Golingo
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Publication number: 20200058411Abstract: An example method includes directing gas, via one or more first valves, from within an inner electrode to an acceleration region between the inner electrode and an outer electrode that substantially surrounds the inner electrode, directing gas, via two or more second valves, from outside the outer electrode to the acceleration region, and applying, via a power supply, a voltage between the inner in electrode and the outer electrode, thereby converting at least a portion of the directed gas into a plasma saving a substantially annular cross section, the plasma flowing axially within the acceleration region toward a first end of the inner electrode and a first end of the outer electrode and, thereafter, establishing a Z-pinch plasma that flows between the first end of the outer electrode and the first end of the inner electrode. Related plasma confinement systems and methods are also disclosed herein.Type: ApplicationFiled: February 23, 2018Publication date: February 20, 2020Inventors: Uri SHUMLAK, Brian A. NELSON, Raymond GOLINGO
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Publication number: 20190277268Abstract: An example method for producing thrust includes injecting a neutral gas into a cavity between an outer electrode and an inner electrode of a thruster, ionizing the neutral gas within the cavity into a plasma, causing the plasma to form into a plasma arc between the end of the inner electrode and the exhaust orifice of the outer electrode, generating a magnetic field that applies pressure on the plasma arc, maintaining stability of the plasma arc, and exhausting the plasma arc out of the exhaust orifice based on the applied pressure of the magnetic field, thereby producing thrust.Type: ApplicationFiled: March 12, 2018Publication date: September 12, 2019Inventors: Dejan Nikic, James A. Grossnickle, Arthur C. Day, Uri Shumlak, Raymond Golingo
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Patent number: 7825391Abstract: Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.Type: GrantFiled: April 10, 2008Date of Patent: November 2, 2010Assignee: The University of WashingtonInventors: Uri Shumlak, Raymond Golingo, Brian A. Nelson
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Publication number: 20080272317Abstract: Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.Type: ApplicationFiled: April 10, 2008Publication date: November 6, 2008Applicant: University of WashingtonInventors: Uri Shumlak, Raymond Golingo, Brian A. Nelson
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Patent number: 7372059Abstract: Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.Type: GrantFiled: October 17, 2005Date of Patent: May 13, 2008Assignee: The University of WashingtonInventors: Uri Shumlak, Raymond Golingo, Brian A. Nelson
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Publication number: 20070085042Abstract: Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.Type: ApplicationFiled: October 17, 2005Publication date: April 19, 2007Inventors: Uri Shumlak, Raymond Golingo, Brian Nelson