Patents by Inventor Raymond J. Donohue

Raymond J. Donohue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dual metal fill and dual threshold voltage for replacement gate metal devices
    Patent number: 8796128
    Abstract: A structure and method for forming a dual metal fill and dual threshold voltage for replacement gate metal devices is disclosed. A selective deposition process involving titanium and aluminum is used to allow formation of two adjacent transistors with different fill metals and different workfunction metals, enabling different threshold voltages in the adjacent transistors.
    Type: Grant
    Filed: February 7, 2012
    Date of Patent: August 5, 2014
    Assignee: International Business Machines Corporation
    Inventors: Lisa F. Edge, Nathaniel Berliner, James John Demarest, Balasubramanian S. Haran, Raymond J. Donohue