Patents by Inventor Raymond Jacobus Knaapen
Raymond Jacobus Knaapen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140291879Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: ApplicationFiled: June 13, 2014Publication date: October 2, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela KRUIJT-STEGEMAN, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
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Patent number: 8753557Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: GrantFiled: December 20, 2011Date of Patent: June 17, 2014Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
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Publication number: 20120091629Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: ApplicationFiled: December 20, 2011Publication date: April 19, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela KRUIJT-STEGEMAN, Raymond Jacobus Knaapen, Johan Frederik Dijksman, Krassimir Todorov Krastev, Sander Frederik Wuister, Aleksey Yurievich Kolesnychencko, Karel Diederick Van Der Mast, Klaus Simon
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Patent number: 8100684Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: GrantFiled: February 24, 2009Date of Patent: January 24, 2012Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
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Patent number: 7943080Abstract: A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.Type: GrantFiled: December 23, 2005Date of Patent: May 17, 2011Assignee: ASML Netherlands B.V.Inventors: Johan Frederik Dijksman, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Patent number: 7628875Abstract: A method of bonding a MEMS device to a substrate to form a MEMS device assembly. A thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate is determined. An adhesive is deposited onto a mating surface of the MEMS device and/or the mating surface of the substrate. The mating surfaces of the MEMS device and substrate are brought together, such that the adhesive can bond the MEMS device to the substrate. The volume of adhesive deposited at particular locations on the mating surface is varied to compensate for local variations in the thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate.Type: GrantFiled: September 12, 2006Date of Patent: December 8, 2009Assignee: ASML Netherlands B.V.Inventors: Jan Bex, Raymond Jacobus Knaapen, Gerard Johannes Pieter Nijsse, Gerard Kums
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Publication number: 20090212462Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: ApplicationFiled: February 24, 2009Publication date: August 27, 2009Applicant: ASML NETHERLANS B.V.Inventors: Yvonne Wendela KRUIJT-STEGEMAN, Raymond Jacobus Knaapen, Johan Frederik Dijksman, Krassimir Todorov Krastev, Sander Frederik Wuister, Aleksey Yurievich Kolesnychenko, Karal Diederick Van Der Mast, Klaus Simon
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Patent number: 7517211Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: GrantFiled: December 21, 2005Date of Patent: April 14, 2009Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Knaapen, Johan Frederik Dijksman, Krassimir Todorov Krastev, Sander Frederik Wuister, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon
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Publication number: 20080063830Abstract: A method of bonding a MEMS device to a substrate to form a MEMS device assembly. A thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate is determined. An adhesive is deposited onto a mating surface of the MEMS device and/or the mating surface of the substrate. The mating surfaces of the MEMS device and substrate are brought together, such that the adhesive can bond the MEMS device to the substrate. The volume of adhesive deposited at particular locations on the mating surface is varied to compensate for local variations in the thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate.Type: ApplicationFiled: September 12, 2006Publication date: March 13, 2008Applicant: ASML Netherlands B.V.Inventors: Jan Bex, Raymond Jacobus Knaapen, Gerard Johannes Pieter Nijsse, Gerard Kums
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Publication number: 20060131183Abstract: A grinding machine (1) for grinding a workpiece (40) comprises the following components: a cup wheel (10) having an annular grinding surface (11); a disc-shaped electrode (60), which is positioned in the vicinity of at least a portion of the grinding surface (11) such that a dressing area (75) is obtained in which a relatively small gap is present between the electrode (60) and the grinding surface (11), feed means (70) for feeding electrolyte to the dressing area (75); and a generator (20) for generating an electric current between the grinding surface (11) and the electrode (60), via the electrolyte. The electrode (60) is movable with respect to the dressing area (75), so that contamination of the electrode (60), which normally occurs as a result of the dressing process, is continuously removed. Consequently, the quality of the dressing process is maintained at a high level.Type: ApplicationFiled: January 20, 2004Publication date: June 22, 2006Applicant: Koninklijke Philips Electronics N.V.Inventors: Raymond Jacobus Knaapen, Marinus Josephus Dona, Krassimir Krastev, Jakob Vijfvinkel, Piet Van Rens