Patents by Inventor Raymond Jacobus Knaapen

Raymond Jacobus Knaapen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140291879
    Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
    Type: Application
    Filed: June 13, 2014
    Publication date: October 2, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yvonne Wendela KRUIJT-STEGEMAN, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
  • Patent number: 8753557
    Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: June 17, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
  • Publication number: 20120091629
    Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
    Type: Application
    Filed: December 20, 2011
    Publication date: April 19, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yvonne Wendela KRUIJT-STEGEMAN, Raymond Jacobus Knaapen, Johan Frederik Dijksman, Krassimir Todorov Krastev, Sander Frederik Wuister, Aleksey Yurievich Kolesnychencko, Karel Diederick Van Der Mast, Klaus Simon
  • Patent number: 8100684
    Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
    Type: Grant
    Filed: February 24, 2009
    Date of Patent: January 24, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
  • Patent number: 7943080
    Abstract: A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.
    Type: Grant
    Filed: December 23, 2005
    Date of Patent: May 17, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Johan Frederik Dijksman, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
  • Patent number: 7628875
    Abstract: A method of bonding a MEMS device to a substrate to form a MEMS device assembly. A thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate is determined. An adhesive is deposited onto a mating surface of the MEMS device and/or the mating surface of the substrate. The mating surfaces of the MEMS device and substrate are brought together, such that the adhesive can bond the MEMS device to the substrate. The volume of adhesive deposited at particular locations on the mating surface is varied to compensate for local variations in the thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: December 8, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Bex, Raymond Jacobus Knaapen, Gerard Johannes Pieter Nijsse, Gerard Kums
  • Publication number: 20090212462
    Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
    Type: Application
    Filed: February 24, 2009
    Publication date: August 27, 2009
    Applicant: ASML NETHERLANS B.V.
    Inventors: Yvonne Wendela KRUIJT-STEGEMAN, Raymond Jacobus Knaapen, Johan Frederik Dijksman, Krassimir Todorov Krastev, Sander Frederik Wuister, Aleksey Yurievich Kolesnychenko, Karal Diederick Van Der Mast, Klaus Simon
  • Patent number: 7517211
    Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: April 14, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Knaapen, Johan Frederik Dijksman, Krassimir Todorov Krastev, Sander Frederik Wuister, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon
  • Publication number: 20080063830
    Abstract: A method of bonding a MEMS device to a substrate to form a MEMS device assembly. A thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate is determined. An adhesive is deposited onto a mating surface of the MEMS device and/or the mating surface of the substrate. The mating surfaces of the MEMS device and substrate are brought together, such that the adhesive can bond the MEMS device to the substrate. The volume of adhesive deposited at particular locations on the mating surface is varied to compensate for local variations in the thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate.
    Type: Application
    Filed: September 12, 2006
    Publication date: March 13, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Jan Bex, Raymond Jacobus Knaapen, Gerard Johannes Pieter Nijsse, Gerard Kums
  • Publication number: 20060131183
    Abstract: A grinding machine (1) for grinding a workpiece (40) comprises the following components: a cup wheel (10) having an annular grinding surface (11); a disc-shaped electrode (60), which is positioned in the vicinity of at least a portion of the grinding surface (11) such that a dressing area (75) is obtained in which a relatively small gap is present between the electrode (60) and the grinding surface (11), feed means (70) for feeding electrolyte to the dressing area (75); and a generator (20) for generating an electric current between the grinding surface (11) and the electrode (60), via the electrolyte. The electrode (60) is movable with respect to the dressing area (75), so that contamination of the electrode (60), which normally occurs as a result of the dressing process, is continuously removed. Consequently, the quality of the dressing process is maintained at a high level.
    Type: Application
    Filed: January 20, 2004
    Publication date: June 22, 2006
    Applicant: Koninklijke Philips Electronics N.V.
    Inventors: Raymond Jacobus Knaapen, Marinus Josephus Dona, Krassimir Krastev, Jakob Vijfvinkel, Piet Van Rens