Patents by Inventor Raymond Jacobus Wilhelmus Knaapen
Raymond Jacobus Wilhelmus Knaapen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11149352Abstract: Method of performing atomic layer deposition. The method comprises supplying a precursor gas towards a substrate, using a deposition head including one or more gas supplies, including a precursor gas supply. The precursor gas reacts near a surface of the substrate for forming an atomic layer. The deposition head has an output face comprising the gas supplies, which at least partly faces the substrate surface during depositing the atomic layer. The output face has a substantially rounded shape defining a movement path of the substrate. The precursor-gas supply is moved relative to the substrate by rotating the deposition head while supplying the precursor gas, for depositing a stack of atomic layers while continuously moving in one direction. The surface of the substrate is kept contactless with the output face by means of a gas bearing.Type: GrantFiled: February 6, 2014Date of Patent: October 19, 2021Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNOInventors: Raymond Jacobus Wilhelmus Knaapen, Ruud Olieslagers, Dennis van den Berg, Matijs C. van den Boer, Freddy Roozeboom
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Patent number: 10654217Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.Type: GrantFiled: January 8, 2018Date of Patent: May 19, 2020Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram, Raymond Wilhelmus Louis Lafarre
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Patent number: 10428423Abstract: A method of depositing an atomic layer on a substrate comprises supplying a precursor gas from a precursor-gas supply comprised in a drum; the drum being rotatable with respect to a sealing piece that receives gas from a gas source. One of the drum or sealing piece comprising one or more gas feed channels in fluid connection with the precursor-gas supply and the other of the drum or sealing piece comprises one or more circumferential grooves in its surface sealed by the one of the drum or sealing piece thereby preventing a fluid flowpath in radial direction and leaving a fluid flow path in circumferential direction. At least one sealed groove is provided with one or more separations separating adjacent zones of process gas feeds in the sealed groove, thus allowing zones to provide for mutually differing process gas compositions to have the precursor gas react near, e.g. on, the substrate thus depositing a stack of atomic layers of a gradient composition.Type: GrantFiled: June 19, 2015Date of Patent: October 1, 2019Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNOInventors: Paulus Willibrordus George Poodt, Raymond Jacobus Wilhelmus Knaapen
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Publication number: 20180162040Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.Type: ApplicationFiled: January 8, 2018Publication date: June 14, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram, Raymond Wilhelmus Louis Lafarre
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Patent number: 9889597Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.Type: GrantFiled: November 11, 2013Date of Patent: February 13, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram, Raymond Wilhelmus Louis Lafarre
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Publication number: 20170191158Abstract: A method of depositing an atomic layer on a substrate comprises supplying a precursor gas from a precursor-gas supply comprised in a drum; the drum being rotatable with respect to a sealing piece that receives gas from a gas source. One of the drum or sealing piece comprising one or more gas feed channels in fluid connection with the precursor-gas supply and the other of the drum or sealing piece comprises one or more circumferential grooves in its surface sealed by the one of the drum or sealing piece thereby preventing a fluid flowpath in radial direction and leaving a fluid flow path in circumferential direction. At least one sealed groove is provided with one or more separations separating adjacent zones of process gas feeds in the sealed groove, thus allowing zones to provide for mutually differing process gas compositions to have the precursor gas react near, e.g. on, the substrate thus depositing a stack of atomic layers of a gradient composition.Type: ApplicationFiled: June 19, 2015Publication date: July 6, 2017Applicant: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNOInventors: Paulus Willibrordus George Poodt, Raymond Jacobus Wilhelmus Knaapen
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Patent number: 9610727Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: GrantFiled: June 13, 2014Date of Patent: April 4, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Wilhelmus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
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Patent number: 9567671Abstract: Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum. The method further comprises switching between supplying the precursor gas from the precursor-gas supply towards the substrate over a first part of the rotation trajectory; and interrupting supplying the precursor gas from the precursor-gas supply over a second part of the rotation trajectory.Type: GrantFiled: July 30, 2012Date of Patent: February 14, 2017Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNOInventors: Raymond Jacobus Wilhelmus Knaapen, Ruud Olieslagers, Dennis Van Den Berg, Matijs C. Van Den Boer, Diederik Jan Maas, Jacques Cor Johan Van Der Donck, Freddy Roozeboom
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Publication number: 20150376785Abstract: Method of performing atomic layer deposition. The method comprises supplying a precursor gas towards a substrate, using a deposition head including one or more gas supplies, including a precursor gas supply. The precursor gas reacts near a surface of the substrate for forming an atomic layer. The deposition head has an output face comprising the gas supplies, which at least partly faces the substrate surface during depositing the atomic layer. The output face has a substantially rounded shape defining a movement path of the substrate. The precursor-gas supply is moved relative to the substrate by rotating the deposition head while supplying the precursor gas, for depositing a stack of atomic layers while continuously moving in one direction. The surface of the substrate is kept contactless with the output face by means of a gas bearing.Type: ApplicationFiled: February 6, 2014Publication date: December 31, 2015Applicant: Nederlandse Organisatie voor toegepast- natuurwetenschappeliijk onderzoek TNOInventors: Raymond Jacobus Wilhelmus Knaapen, Ruud Olieslagers, Dennis van den Berg, Matijs C. van den Boer, Freddy Roozeboom
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Publication number: 20150086715Abstract: Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.Type: ApplicationFiled: July 30, 2012Publication date: March 26, 2015Applicant: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNOInventors: Raymond Jacobus Wilhelmus Knaapen, Ruud Olieslagers, Dennis Van Den Berg, Matijs C. Van Den Boer, Diederik Jan Maas, Jacques Cor Johan Van Der Donck, Freddy Roozeboom
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Publication number: 20140124971Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.Type: ApplicationFiled: November 11, 2013Publication date: May 8, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela KRUIJT-STEGEMAN, Raymond Jacobus Wilhelmus Knaapen, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram, Raymond Wilhelmus Louis Lafarre
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Patent number: 8579625Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.Type: GrantFiled: October 10, 2008Date of Patent: November 12, 2013Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram, Raymond Wilhelmus Louis LaFarre
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Patent number: 7641467Abstract: An imprint lithography apparatus includes an imprint template operably connected to an imprint actuator. The imprint actuator is actuatable to displace the template along an imprint axis to bring the template into contact with an imprintable medium. The template is connected to the actuator via a bearing configured to permit substantially unrestricted displacement of the actuator relative to the template along an axis substantially perpendicular to the imprint axis during release of the template from the imprintable medium.Type: GrantFiled: May 2, 2007Date of Patent: January 5, 2010Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Raymond Wilhelmus Louis Lafarre
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Publication number: 20090108484Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.Type: ApplicationFiled: October 10, 2008Publication date: April 30, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Johan Frederik Dijksman, Sander Frederik Wuister, Ivar Schram, Raymond Wilhelmus Louis Lafarre
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Publication number: 20080271628Abstract: An imprint lithography apparatus includes an imprint template operably connected to an imprint actuator. The imprint actuator is actuatable to displace the template along an imprint axis to bring the template into contact with an imprintable medium. The template is connected to the actuator via a bearing configured to permit substantially unrestricted displacement of the actuator relative to the template along an axis substantially perpendicular to the imprint axis during release of the template from the imprintable medium.Type: ApplicationFiled: May 2, 2007Publication date: November 6, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Raymond Wilhelmus Louis Lafarre
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Publication number: 20080206385Abstract: The invention relates to an indentation apparatus (1) comprising a force frame (13) and a positioning frame (14). An indentation tool (5) is pressed into a work piece (7) in order to master a mould. The work piece (7) is supported by the base (6). An actuator (2) is mounted in the force frame (13). The actuator (2) and the indentation tool head (4) are connected with a rod (3). The rod (3) is fixed with flexible (swivel) joints (15) to said indentation tool (4) and said actuator (2) in order to physically decouple said force frame (13) and said positioning frame (14) from forces. Also a force sensor (9) is installed between the indentation tool (4) and the positioning frame (14). In order to keep the positioning frame unloaded, the balance force delivered by said force frame actuator (2) should be approximately equal to the indentation force. The signal of the force sensor (9) is interpreted by control electronics (10).Type: ApplicationFiled: April 28, 2006Publication date: August 28, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Krassimir Todorov Krastev, Raymond Jacobus Wilhelmus Knaapen, Marinus Josephus Jakobus Dona, Patericus Dijk, Johannes Martinus Maria Swinkels, Johannes Cornelis Van Den Ven