Patents by Inventor Raymond K. Eby

Raymond K. Eby has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for aligning patterns on a substrate
    Patent number: 8043652
    Abstract: A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.
    Type: Grant
    Filed: September 10, 2007
    Date of Patent: October 25, 2011
    Assignee: Nanoink, Inc.
    Inventors: Raymond K. Eby, Michael Nelson, Igor Touzov
  • METHOD AND APPARATUS FOR ALIGNING PATTERNS ON A SUBSTRATE
    Publication number: 20080147346
    Abstract: A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.
    Type: Application
    Filed: September 10, 2007
    Publication date: June 19, 2008
    Inventors: Raymond K. Eby, Michael Nelson, Igor Touzov
  • Method and apparatus for aligning patterns on a substrate
    Patent number: 7279046
    Abstract: A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: October 9, 2007
    Assignee: NanoInk, Inc.
    Inventors: Raymond K. Eby, Michael Nelson, Igor Touzov
  • Nanolithographic calibration methods
    Patent number: 7060977
    Abstract: A system and method for calibration of nanolithography includes fabricating a nanoscale test pattern, measuring a parameter of the test pattern, and calculating a calibration coefficient from the measured parameter. The calculated calibration coefficient is then used for nanolithography. Nanolithography can be carried out with nanoscopic tips depositing patterning compounds on a substrate.
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: June 13, 2006
    Assignee: Nanoink, Inc.
    Inventors: Sylvain Cruchon Dupeyrat, Mike Nelson, Raymond K. Eby
  • Method and apparatus for aligning patterns on a substrate
    Publication number: 20030185967
    Abstract: A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.
    Type: Application
    Filed: February 14, 2003
    Publication date: October 2, 2003
    Inventors: Raymond K. Eby, Michael Nelson, Igor Touzov