Abstract: An electrode assembly for a plasma reactor, such as a plasma etch or plasma-enhanced chemical vapor deposition reactor, comprises an electrode plate having a support frame attached to one surface thereof. The electrode plate is composed of a substantially pure material which is compatible with a particular reaction being performed in the reactor, while the support frame is composed of a material having desirable thermal, electrical, and structural characteristics. The support frame is bonded to the electrode plate using a bonding layer, usually a ductile metallic bonding layer, which provides effective thermal and electrical coupling while permitting a degree of thermal expansion mismatch between the support frame and the electrode plate.

Abstract: A workpiece transfer apparatus includes a drive assembly and a transfer arm assembly. The transfer arm assembly is articulated, including a linking arm enclosure pivotally attached to a transfer arm. The linking arm enclosure is mounted on a rotatable sleeve, which in turn is mounted in a bearing assembly which is mountable in a housing. A shaft runs axially through the sleeve and terminates with a pulley within the linking arm enclosure. The transfer arm is coupled to the shaft so that rotation of the sleeve relative to the shaft causes articulation of the transfer arm assembly. A first motor causes rotation of the sleeve and the shaft simultaneously, which effects rotation of the transfer arm relative to the housing. A second motor rotates the sleeve relative to the shaft, causing translation of the transfer arm relative to the housing.

Abstract: A polishing apparatus is provided having a flat, stiffly elastic mounting plate for the workpieces. The workpieces are placed in contact with a rotating polishing plate but are kept from rotating along with it by a holder secured to the mounting plate. The flat face of the holder is spaced from the mounting plate. An annular ring is fixed in position between, and in contact with, the face of the holder and the mounting plate. As the workpieces are pressed against the polishing plate by a force transmitted through the holder, the ring, and the mounting plate, the mounting plate assumes a given curvature depending in part on the radius of the ring.

Abstract: An electrode assembly for a plasma reactor, such as a plasma etch or plasma-enhanced chemical vapor deposition reactor, comprises an electrode plate having a support frame attached to one surface thereof. The electrode plate is composed of a substantially pure material which is compatible with a particular reaction being performed in the reactor, while the support frame is composed of a material having desirable thermal, electrical, and structural characteristics. The support frame is bonded to the electrode plate using a bonding layer, usually a ductile metallic bonding layer, which provides effective thermal and electrical coupling while permitting a degree of thermal expansion mismatch between the support frame and the electrode plate.