Patents by Inventor Raymond Laurentius Schrijver

Raymond Laurentius Schrijver has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20050170296
    Abstract: A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.
    Type: Application
    Filed: January 29, 2004
    Publication date: August 4, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Albert Johannes Jansen, Jan Kuit, Erik Loopstra, Raymond Laurentius Schrijver