Abstract: The present disclosure relates, in general, to methods for treating cancer comprising administering to a subject in need thereof an effective amount of CXCL9, CXCL10 or the combination, in combination with an immune checkpoint inhibitor. The CXCL9, CXCL10 or combination may be administered as a polypeptide, a polynucleotide or cells comprising a polynucleotide encoding CXCL9, CXCL10 or both. In one aspect, the treatment is amenable to patients with low or high mutational burden tumors.

Abstract: A manufacturing method of a semiconductor package includes the following steps. Firstly, a conductive carrier is provided. Then, a first conductive layer is formed on a lower surface of the conductive carrier. Then, a second conductive layer is formed on a lower surface of the first conductive layer, wherein the second conductive layer and the first conductive layer together constitute a conductive structure. Then, an electrical component is disposed on the lower surface of the first conductive layer. Then, a first package body encapsulating the first conductive layer, the second conductive layer and the electrical component but not covering an edge of the lower surface of the conductive carrier is formed. Then, a portion of the first package body is removed. Then, partial material of the conductive carrier is removed, such that a reserved part of the conductive carrier forms a ring-shaped conductive structure.

Abstract: Described is a system and method for assisting users in properly placing and/or positioning items at inventory locations within a materials handling facility. In one example, a placement location may be distinguished for the user through use of illumination or other techniques to assist the user in quickly identifying the proper location at which to place the item. Likewise, a proper position of the item may be presented to the user to assist the user in properly positioning the item at the placement location.

Abstract: A manufacturing method of a package substrate is provided. A conductive substrate is provided. A first photoresist layer is patterned to form first openings. A first conductive layer is formed in the first openings. A second photoresist layer is patterned to form second openings. A second conductive layer contacting the first conductive layer is formed in the second openings. The first and second photoresist layers are removed. A dielectric layer covers the first, second conductive layers and a portion of the conductive substrate. A portion of the dielectric layer is removed. A third photoresist layer is patterned to form a third opening. A portion of the conductive substrate is removed to form a fourth opening. The third photoresist layer is removed. A fourth photoresist layer is patterned to form a fifth opening. A bonding pad is formed in the fifth opening. The fourth photoresist layer is removed.

Abstract: A semiconductor structure and a method of fabricating the same. The semiconductor structure comprises: a layer element, one or more supporting elements disposed on a first surface of the layer element, and one or more anchoring elements disposed within the layer element and connected to the one or more supporting elements to couple the one or more supporting elements to the layer element to strengthen the layer element.

Abstract: A manufacturing method of a semiconductor package includes the following steps. Firstly, a conductive carrier is provided. Then, a first conductive layer is formed on a lower surface of the conductive carrier. Then, a second conductive layer is formed on a lower surface of the first conductive layer, wherein the second conductive layer and the first conductive layer together constitute a conductive structure. Then, an electrical component is disposed on the lower surface of the first conductive layer. Then, a first package body encapsulating the first conductive layer, the second conductive layer and the electrical component but not covering an edge of the lower surface of the conductive carrier is formed. Then, a portion of the first package body is removed. Then, partial material of the conductive carrier is removed, such that a reserved part of the conductive carrier forms a ring-shaped conductive structure.

Abstract: A semiconductor structure and a method of fabricating the same. The semiconductor structure comprises: a layer element, one or more supporting elements disposed on a first surface of the layer element, and one or more anchoring elements disposed within the layer element and connected to the one or more supporting elements to couple the one or more supporting elements to the layer element to strengthen the layer element.

Abstract: A substrate structure, a semiconductor package and a manufacturing method of semiconductor package are provided. The substrate structure comprises a conductive structure, an electrical component, a package body and a ring-shaped conductive structure. The conductive structure comprises a first conductive layer and a second conductive layer. The first conductive layer has a lower surface. The second conductive layer and the electrical component are formed on the lower surface of the first conductive layer. The package body encapsulates the conductive structure and the electrical component and has an upper surface. The ring-shaped conductive structure surrounds the conductive structure and the electrical component and is disposed at the edge of the upper surface of the package body to expose the conductive structure.

Abstract: A manufacturing method of a substrate structure is provided. The method includes the following steps. Firstly, a conductive carrier is provided. Then, a first metal layer is formed on the conductive carrier. Then, a second metal layer is formed on the first metal layer. Then, a third metal layer is formed on the second metal layer, wherein each of the second metal layer and the third metal layer has a first surface and a second surface opposite to the first surface, the first surface of the third metal layer is connected to the second surface of the second metal layer, the surface area of the first surface of the third metal layer is larger than the surface area of the second surface of the second metal layer, and the first metal layer, the second metal layer and the third metal layer form a conductive structure.

Abstract: A semiconductor package includes a dielectric layer, a plurality of traces, a plurality of electrical pads, a plurality of studs and at least a semiconductor device. The dielectric layer has a first dielectric surface and a second dielectric surface opposite the first dielectric surface. The traces are disposed in the dielectric layer and are exposed on the second dielectric surface. The electrical pads are disposed on the first dielectric surface. The studs are disposed in the dielectric layer and are exposed on the first dielectric surface. The studs are electrically connected to the traces and the electrical pads. The semiconductor device is disposed on the second dielectric surface and electrically connected to the traces.

Abstract: A manufacturing method of a package substrate is provided. A conductive substrate is provided. A first photoresist layer is patterned to form first openings. A first conductive layer is formed in the first openings. A second photoresist layer is patterned to form second openings. A second conductive layer contacting the first conductive layer is formed in the second openings. The first and second photoresist layers are removed. A dielectric layer covers the first, second conductive layers and a portion of the conductive substrate. A portion of the dielectric layer is removed. A third photoresist layer is patterned to form a third opening. A portion of the conductive substrate is removed to form a fourth opening. The third photoresist layer is removed. A fourth photoresist layer is patterned to form a fifth opening. A bonding pad is formed in the fifth opening. The fourth photoresist layer is removed.

Abstract: A manufacturing method of a substrate structure is provided. The method includes the following steps. Firstly, a conductive carrier is provided. Then, a first metal layer is formed on the conductive carrier. Then, a second metal layer is formed on the first metal layer. Then, a third metal layer is formed on the second metal layer, wherein each of the second metal layer and the third metal layer has a first surface and a second surface opposite to the first surface, the first surface of the third metal layer is connected to the second surface of the second metal layer, the surface area of the first surface of the third metal layer is larger than the surface area of the second surface of the second metal layer, and the first metal layer, the second metal layer and the third metal layer form a conductive structure.

Abstract: A package substrate including a dielectric layer, a first conductive layer, a second conductive layer and a bonding pad is provided. The dielectric layer has a top surface and a bottom surface. The first conductive layer is embedded into the dielectric layer, and a first surface of the first conductive layer is exposed from the top surface and has the same plane with the top surface. The second conductive layer is embedded into the dielectric layer and contacts the first conductive layer, and a second surface of the second conductive layer is exposed from the bottom surface and has the same plane with the bottom surface. The bonding pad is partially or completely embedded into the first conductive layer and the dielectric layer, so that the periphery of the bonding pad is confined within a cavity by the sidewalls of both the first conductive layer and the dielectric layer.

Abstract: A semiconductor package includes a dielectric layer, a plurality of traces, a plurality of electrical pads, a plurality of studs and at least a semiconductor device. The dielectric layer has a first dielectric surface and a second dielectric surface opposite the first dielectric surface. The traces are disposed in the dielectric layer and are exposed on the second dielectric surface. The electrical pads are disposed on the first dielectric surface. The studs are disposed in the dielectric layer and are exposed on the first dielectric surface. The studs are electrically connected to the traces and the electrical pads. The semiconductor device is disposed on the second dielectric surface and electrically connected to the traces.

Abstract: A substrate structure includes first, second and third metal layers embedded in a dielectric layer between its opposite upper first and lower second surfaces. The entire upper surface of the first metal layer is exposed on the first surface of the dielectric layer, the entire lower surface of the third metal layer is exposed on the second surface of the dielectric layer, and the second metal layer is disposed between the first metal layer and the third metal layer, wherein the area of the third metal layer is larger than the area of the second metal layer.

Abstract: Methods and apparatus are provided for virtualizing resources such as host bus adapters connected to a storage area network. Resources are offloaded from individual servers onto a resource virtualization switch. Servers are connected to the resource virtualization switch using an I/O bus connection. Servers are assigned resources such as virtual host bus adapters and share access to physical host bus adapters included in the resource virtualization switch. Redundancy can be provided using multipathing mechanisms.

Abstract: A semiconductor structure and a method of fabricating the same. The semiconductor structure comprises: a layer element, one or more supporting elements disposed on a first surface of the layer element, and one or more anchoring elements disposed within the layer element and connected to the one or more supporting elements to couple the one or more supporting elements to the layer element to strengthen the layer element.

Abstract: The semiconductor device carrier comprises a conductive carrier, a dielectric layer, a conductive trace layer, a conductive stud layer and the plating conductive layer. The conductive carrier comprises at least one cavity. The dielectric layer has a first dielectric surface and a second dielectric surface opposite the first dielectric surface. The conductive trace layer disposes in the dielectric layer and is exposed on the second dielectric surface. The conductive stud layer disposes in the dielectric layer and is exposed on the first dielectric surface, wherein the conductive stud layer is electrically connected to the conductive trace layer. The plating conductive layer is disposed on the first dielectric surface and the exposed conductive stud layer. The cavity exposes the conductive trace layer and the dielectric layer.

Abstract: A method of forming a substrate (10) for semiconductor packaging and a substrate (10) for semiconductor packaging are provided. The method includes providing a carrier (12) and forming a plurality of external pads (14) on the carrier (12), the external pads (14) formed on the carrier (12) defining a first conductive layer. A molding operation is performed to form a first insulating layer (20) on the carrier (12) with a molding compound (22). The first conductive layer is embedded in the first insulating layer (20). One or more of a plurality of bond pads (30), a plurality of conductive traces (32) and a plurality of microvias (56) are formed on the first conductive layer, the one or more of the bond pads (30), the conductive traces (32) and the microvias (56) formed on the first conductive layer defining a second conductive layer.

Abstract: The semiconductor device carrier comprises a conductive carrier, a dielectric layer, a conductive trace layer, a conductive stud layer and the plating conductive layer. The conductive carrier comprises at least one cavity. The dielectric layer has a first dielectric surface and a second dielectric surface opposite the first dielectric surface. The conductive trace layer disposes in the dielectric layer and is exposed on the second dielectric surface. The conductive stud layer disposes in the dielectric layer and is exposed on the first dielectric surface, wherein the conductive stud layer is electrically connected to the conductive trace layer. The plating conductive layer is disposed on the first dielectric surface and the exposed conductive stud layer. The cavity exposes the conductive trace layer and the dielectric layer.