Patents by Inventor Raymond M. Mayer

Raymond M. Mayer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering target with bonding layer of varying thickness under target material
    Patent number: 8123919
    Abstract: Certain example embodiments of this invention relate to a rotatable magnetron sputtering target(s) for use in sputtering material(s) onto a substrate. In certain example embodiments, the target includes a cathode tube with a target material applied thereto via plasma spraying or the like. A bonding layer is provided on the tube, between the cathode tube and the target material. The bonding layer is thicker proximate at least one end portion of the target than at a central portion of the target in order to reduce the likelihood of burn-through to or of the cathode tube during sputtering.
    Type: Grant
    Filed: September 20, 2005
    Date of Patent: February 28, 2012
    Assignee: Guardian Industries Corp.
    Inventors: Raymond M. Mayer, Yiwei Lu