Abstract: An iono-refractive structure that includes one or more ion insertion layers having a real portion and an imaginary portion of the dielectric constant is provided. While both the real portion and the imaginary portion of the dielectric constant change, the change in the imaginary portion is less than the change in the real portion at the wavelength of interest or at the operational wavelength. The iono-refractive structure may be suitable for the fabrication of or integration with tunable optical filters, wavelength-selective optical elements, active modulated interferometers, optical phase shifters, optical phased array beam steering, optical phased array beam tracking, tunable optical filters, sensors, variable lenses, tunable diffraction gratings, and other optical components.

Abstract: An iono-refractive structure that includes one or more ion insertion layers having a real portion and an imaginary portion of the dielectric constant is provided. While both the real portion and the imaginary portion of the dielectric constant change, the change in the imaginary portion is less than the change in the real portion at the wavelength of interest or at the operational wavelength. The iono-refractive structure may be suitable for the fabrication of or integration with tunable optical filters, wavelength-selective optical elements, active modulated interferometers, optical phase shifters, optical phased array beam steering, optical phased array beam tracking, tunable optical filters, sensors, variable lenses, tunable diffraction gratings, and other optical components.

Abstract: An iono-refractive structure that includes one or more ion insertion layers having a real portion and an imaginary portion of the dielectric constant is provided. While both the real portion and the imaginary portion of the dielectric constant change, the change in the imaginary portion is less than the change in the real portion at the wavelength of interest or at the operational wavelength. The iono-refractive structure may be suitable for the fabrication of or integration with tunable optical filters, wavelength-selective optical elements, active modulated interferometers, optical phase shifters, optical phased array beam steering, optical phased array beam tracking, tunable optical filters, sensors, variable lenses, tunable diffraction gratings, and other optical components.

Abstract: An improved electrochromic device comprising a substrate and a first conductive layer located on the transparent substrate. An ion storage layer is located on the first conductive layer. An electrolyte layer is located on the ion storage layer with an active layer being located on the electrolyte layer. A second conductive layer is located on the active layer.

Abstract: An improved electrochromic device comprising a substrate and a first conductive layer located on the transparent substrate. An ion storage layer is located on the first conductive layer. An electrolyte layer is located on the ion storage layer with an active layer being located on the electrolyte layer.

Abstract: An improved electrochromic device comprising a substrate and a first conductive layer located on the transparent substrate. An ion storage layer is located on the first conductive layer. An electrolyte layer is located on the ion storage layer with an active layer being located on the electrolyte layer. A second conductive layer is located on the active layer.

Abstract: Proposed is a low loss fiber optic switch which allows exclusive two way communication of data between a number of terminals and various host computers. A rotary switch mechanism allows the terminals to be connected exclusively to the selected host computers. An optical coupling fluid sealed in the switch mechanism minimizes signal losses and promotes higher data transmission rates.

Abstract: What is proposed is an electronic circuit for controlling the amount of AC power delivered to an inductive or resistive load which continuously measures the actual phase lag between the load current and applied voltage and automatically adjusts the firing angle to provide the desired amount of AC power. The circuit includes an auxiliary on/off input with soft start and independently adjustable time delays for the on and off functions and also incorporates an input for remote power level control and features a half-wave rectified mode which delivers pulsating DC power to the load.

Abstract: A method and apparatus are disclosed for continuous plasma etching of generally planar workpieces in which the workpieces are introduced into an evacuated chamber containing the plasma, are carried along a continuous processing path and are removed therefrom. The plasma is generated within the chamber and the workpieces are supported within an electrically neutral field within the processing plasma.

Abstract: What is proposed is an electronic circuit for controlling the amount of AC power delivered to an inductive or resistive load which continuously measures the actual phase lag between the load current and applied voltage and automatically adjusts the firing angle to provide the desired amount of AC power. The circuit includes an auxiliary on/off input with soft start and independently adjustable time delays for the on and off functions and also incorporates an input for remote power level control and features a half-wave rectified mode which delivers pulsating DC power to the load.