Abstract: In certain aspects, the invention is directed to a method for visual programming in an environment having a set of user-invocable function representations, a data processing system for implementing the method and a computer program product with computer-usable program code for implementing the method. The method includes: maintaining a user interface from which a user may access any function representation in the set of user-invocable function representations; receiving a new function representation that is omitted from the set of user-invocable function representations; and storing the new function representation in the set of user-invocable function representations so that the new function representation may be accessed from the user interface.

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.

Abstract: A method of masking surfaces during fabrication of semiconductor devices is disclosed, which includes providing a substrate, and in a preferred embodiment a silicon substrate. The surface is hydrogen terminated (or hydrogenated) and a metal mask is positioned on the surface so as to define a growth area and an unmasked portion on the surface. Ozone is generated at the surface, at least in the unmasked area, by exposing the surface to a light having a wavelength approximately 185 nm (an oxygen absorbing peak), so as to grow an oxide film on the unmasked portion of the surface. The metal mask is removed and the oxide film then serves as a mask for further operations and can be easily removed in situ by heating.

Abstract: Ultra-small semiconductor devices and a method of fabrication including patterning the planar surface of a substrate to form a pattern edge (e.g. a mesa) and consecutively forming a plurality of layers of semiconductor material in overlying relationship to the pattern edge so that a discontinuity is produced in the layers and a first layer on one side of the pattern edge is aligned with and in electrical contact with a different layer on the other side of the pattern edge.