Abstract: A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps.

Abstract: A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.

Abstract: An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which comprises, in cross-section, a feature, and an adjustment fluid source configured to locally change the composition of the immersion liquid to cause a local decrease in surface tension of the immersion liquid at least when a meniscus of the immersion liquid contacts the feature.

Abstract: A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.

Abstract: An immersion lithographic apparatus, including: first and second objects which are spaced apart with a gap therebetween and on whose top surfaces immersion liquid is provided; and a gutter positioned under the gap and configured to collect any immersion liquid which passes through the gap, wherein an advancing contact angle of immersion liquid with surfaces of the first and second objects defining the gap is less than 30°.

Abstract: A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.

Abstract: In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.

Abstract: A device for shaving hairs growing from skin including a base portion having a grip, a shaving head which carries at least one cutting member having at least one cutting edge, and an actuator for effecting a periodical motion of the cutting member relative to the base portion to improve the cutting action of the cutting member. The shaving head is pivotable relative to the base portion about a pivot axis and the periodical motion of the cutting member is a periodical motion relative to the shaving head. The position and orientation of the geometrical path of the periodical motion of the cutting member relative to the skin is well-defined, so that the risk of skin irritations and skin injuries is considerably reduced.

Abstract: A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate. The apparatus is provided with a clamp, including a support part configured to support the patterning device or the substrate and a temperature control part configured to control the temperature of the patterning device or the substrate. The clamp is constructed to mechanically isolate the temperature control part from the support part with a flexible connector so that vibrations, shrink and expansion of the temperature control part will not influence the patterning device and/or the substrate.

Abstract: An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the imprint template. The first actuator is configured to apply a force to the imprint template. The imprint lithography apparatus further includes a second support structure and a second actuator located between the second support structure and the first support structure. The second actuator is configured to apply a force to the second support structure, wherein a range of movement of the second actuator is greater than a range of movement of the first actuator.

Abstract: An imprint lithography apparatus includes an imprint template operably connected to an imprint actuator. The imprint actuator is actuatable to displace the template along an imprint axis to bring the template into contact with an imprintable medium. The template is connected to the actuator via a bearing configured to permit substantially unrestricted displacement of the actuator relative to the template along an axis substantially perpendicular to the imprint axis during release of the template from the imprintable medium.

Abstract: A rollable circular display device (10) is disclosed, comprising, in one embodiment, a ring-shaped display (6) expandable in two dimensions between a stored configuration and an expanded configuration and a body for winding the ring-shaped display in the stored configuration. In another embodiment, the rollable circular display device (10) comprises a housing (20), a circular display (6) expandable in two dimensions between a stored configuration in which the circular display (6) is stored within the housing (20) and an expanded configuration in which the circular display is fully viewable, and an inner cone, being arranged co-axially within the housing (20) and rotatable within the housing, wherein the circular display (6) is wound around the inner cone in the stored configuration.

Abstract: An X-ray examination apparatus (10) comprises radiation modules in the form of an X-ray source (20) and an X-ray detector(18), a main curved arm (12) having opposite end sections (S1, S2) and a first auxiliary arm (14) provided at one end section (S1) of the main arm. The first auxiliary arm carries one radiation module (18) and another radiation module (20) is coupled to the other end section of the main arm. The first auxiliary arm has a shape that complements the curvature of the main curved arm at least at the first end section and is movable with respect to this end section at least in a direction away from it. In this way a wide range of inspection angles as well as a good patient coverage is achieved without limiting the rotational freedom of the apparatus.

Abstract: The invention concerns an X-ray examination device (10) comprising an X-ray source (20), an X-ray detector (18) and a segmented carrier, where the X-ray source and the X-ray detector are rotatable together around an isocentre (32). The segmented carrier includes a main arm (12) on which the X-ray source and X-ray detector are mounted and at least one first auxiliary arm (22) to which the main arm is mounted. The first auxiliary arm is rotatable around a first rotational axis (30) through the isocentre.

Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.

Abstract: An imprint lithography apparatus includes an imprint template operably connected to an imprint actuator. The imprint actuator is actuatable to displace the template along an imprint axis to bring the template into contact with an imprintable medium. The template is connected to the actuator via a bearing configured to permit substantially unrestricted displacement of the actuator relative to the template along an axis substantially perpendicular to the imprint axis during release of the template from the imprintable medium.

Abstract: A system for detachably connecting a first electronic component with a second electronic component (6), whereby a large number of signal lines of the first component are connected with corresponding signal lines of the second component (6). A sheet-like part (2) of the first component is provided with a number of conducting areas (4) arranged in an array at the surface of the sheet-like part (2) near an edge (3) of said sheet-like part (2). Each of said conducting areas (4) is connected with a signal line of the first component. A part of the second component (6) is provided with a number of contact elements (7) arranged in an array at the surface of said part, whereby each of said contact elements (7) is connected with a signal line of the second component (6). Each contact element (7) has a contact surface for contacting one of said conducting areas (4) of the first component.

Abstract: The invention concerns an X-ray examination device (10) comprising an X-ray source (20), an X-ray detector (18) and a segmented carrier, where the X-ray source and the X-ray detector are rotatable together around an isocentre (32). The segmented carrier includes a main arm (12) on which the X-ray source and X-ray detector are mounted and at least one first auxiliary arm (22) to which the main arm is mounted. The first auxiliary arm is rotatable around a first rotational axis (30) through the isocentre.