Patents by Inventor Rebecca Christine Lutsic

Rebecca Christine Lutsic has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for stripping photoresist
    Patent number: 5900351
    Abstract: It has been discovered that organic photoresists may be quickly, coveniently, and completely stripped using a hot hydrogen atmosphere. The substrates are preferably exposed to such atmosphere utilizing a hydrogen conveyor furnace. The gases from the furnace are burned to carbon dioxide and water thereby eliminating the need to dispose of a stripping agent.
    Type: Grant
    Filed: June 3, 1997
    Date of Patent: May 4, 1999
    Assignee: International Business Machines Corporation
    Inventors: Rebecca Christine Lutsic, James Richard Murray, David William Sissenstein, Jr.
  • Method for stripping photoresist employing a hot hydrogen atmosphere
    Patent number: 5691117
    Abstract: It has been discovered that organic photoresists may be quickly, conveniently, and completely stripped using a hot hydrogen atmosphere. The substrates are preferably exposed to such atmosphere utilizing a hydrogen conveyor furnace. The gases from the furnace are burned to carbon dioxide and water thereby eliminating the need to dispose of a stripping agent.
    Type: Grant
    Filed: January 17, 1995
    Date of Patent: November 25, 1997
    Assignee: International Business Machines Corporation
    Inventors: Rebecca Christine Lutsic, James Richard Murray, David William Sissenstein, Jr.