Patents by Inventor Rebecca Dora Mih

Rebecca Dora Mih has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Asymmetrical resist sidewall
    Patent number: 6114096
    Abstract: A photo mask and a method for using the photo mask to make asymmetric resist patterns are provided. A wafer having a resist coating thereon is exposed using the mask of the invention under specially controlled defocus conditions to provide the asymmetric resist pattern profile. The mask which comprises phase shifter means on one or both sides of a light shielding pattern forming material on the mask provides light passing through the mask having a different phase on each side of the light shielding material which produces an asymmetric resist pattern profile.
    Type: Grant
    Filed: October 20, 1998
    Date of Patent: September 5, 2000
    Assignee: International Business Machines Corporation
    Inventors: Rebecca Dora Mih, Donald Coughlin Wheeler, Timothy Allan Brunner
  • Asymmetrical resist sidewall
    Patent number: 5948571
    Abstract: A photo mask and a method for using the photo mask to make asymmetric resist patterns are provided. A wafer having a resist coating thereon is exposed using the mask of the invention under specially controlled defocus conditions to provide the asymmetric resist pattern profile. The mask which comprises phase shifter means on one or both sides of a light shielding pattern forming material on the mask provides light passing through the mask having a different phase on each side of the light shielding material which produces an asymmetric resist pattern profile.
    Type: Grant
    Filed: March 12, 1997
    Date of Patent: September 7, 1999
    Assignee: International Business Machines Corporation
    Inventors: Rebecca Dora Mih, Donald Coughlin Wheeler, Timothy Allan Brunner