Patents by Inventor Rebecca Tsai

Rebecca Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Anti-reflection coatings and methods of preparing and using same
    Patent number: 8936833
    Abstract: Three dimensional anti-reflection porous films or coated substrates and method for forming the films or coated substrates are disclosed, where the films or coatings have optical transmittances of at least 86% or a reflectance of at most 4%. The 3D anti-reflection porous film or coating compositions (a) one polymer or a plurality of network polymers, (b) one particles and/or a plurality particles, (c) optionally one crosslinking agent or a plurality of crosslinking agents, (d) optionally one oligomer or a plurality of oligomers, (e) optionally one polymerized monomer or a plurality of polymerized monomers, and (f) optionally void spaces, where the composition has a transmittance value of at least 86% or a reflectance value of at most 4%.
    Type: Grant
    Filed: March 2, 2009
    Date of Patent: January 20, 2015
    Assignee: The University of Houston System
    Inventors: Rigoberto Advincula, Rebecca Tsai, Kazuya Katoh, Roderick Pernites
  • Anti-reflection coatings and methods of preparing and using same
    Publication number: 20090233077
    Abstract: Three dimensional anti-reflection porous films or coated substrates and method for forming the films or coated substrates are disclosed, where the films or coatings have optical transmittances of at least 86% or a reflectance of at most 4%. The 3D anti-reflection porous film or coating compositions (a) one polymer or a plurality of network polymers, (b) one particles and/or a plurality particles, (c) optionally one crosslinking agent or a plurality of crosslinking agents, (d) optionally one oligomer or a plurality of oligomers, (e) optionally one polymerized monomer or a plurality of polymerized monomers, and (f) optionally void spaces, where the composition has a transmittance value of at least 86% or a reflectance value of at most 4%.
    Type: Application
    Filed: March 2, 2009
    Publication date: September 17, 2009
    Inventors: Rigoberto Advincula, Rebecca Tsai, Kazuya Katoh, Roderick Pernites