Patents by Inventor Reed Lawrence

Reed Lawrence has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060194454
    Abstract: Oxide films are deposited under conditions generating a silicon-rich oxide in which silicon nanoclusters form either during deposition or during subsequent annealing. Such deposition conditions include those producing films with optical indices (n) greater than 1.46. The method of the present invention reduces the TID radiation-induced shifts for the oxides.
    Type: Application
    Filed: February 28, 2006
    Publication date: August 31, 2006
    Inventors: Harold Hughes, Bernard Mrstik, Reed Lawrence, Patrick McMarr
  • Patent number: 5688473
    Abstract: An apparatus for replacing particles in a process that transfers particles is disclosed. The apparatus employs a seal zone which is in communication with two zones of the process and in which particles that are being added to the process are purged. The apparatus allows particles to be replaced without reducing the normal rate of particle transfer through the process, which results in a savings in downtime costs. This invention is adaptable to a multitude of processes for the catalytic conversion of hydrocarbons in which deactivated catalyst particles are regenerated.
    Type: Grant
    Filed: March 13, 1996
    Date of Patent: November 18, 1997
    Assignee: UOP
    Inventors: Roger Reed Lawrence, Frank T. Micklich, Charles T. Ressl, Paul Alvin Sechrist