Patents by Inventor Reginald W. Hunter

Reginald W. Hunter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080288369
    Abstract: In one embodiment, a method of viewing eyewear products is provided, which includes capturing a digital image of a consumer; standardizing the digital image of the consumer to a set coordinate system, providing a database containing a collection of eyewear images, wherein the images represent actual products for sale, searching the database of eyewear images using criteria input by the consumer, selecting an eyewear image from the search results, superimposing the selected eyewear image onto the digital image of the consumer to give the appearance of the consumer wearing the eyewear, and viewing the image of the eyewear superimposed on the consumer.
    Type: Application
    Filed: February 26, 2008
    Publication date: November 20, 2008
    Inventor: Reginald W. Hunter
  • Patent number: 6805137
    Abstract: Embodiments of the invention provide a method for removing contaminant particles from a substrate surface, where the method includes supporting a substrate in a face up position on a substrate support member and imparting a broadband impulse to the substrate support member in a direction that is substantially perpendicular to a surface of the substrate. The broadband impulse applied to the substrate support is calculated to be of sufficient magnitude to dislodge contamination particles from the surface of the substrate. The method further includes removing dislodged particles from an area proximate the substrate surface.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: October 19, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Joel Brad Bailey, Reginald W. Hunter
  • Patent number: 6803998
    Abstract: Embodiments of the invention provide an improved method and apparatus for sensing position and/or status of an object. For one embodiment, a method generally includes illuminating the object with an optical pulse source and supplying a first optical pulse to a photo-detector, causing a resonant circuit formed by the photo-detector and an inductor to generate a resonant signal. The method also includes supplying at least a second optical pulse to the photo-detector causing a change in the resonant signal, wherein the second optical pulse is reflected from the object, monitoring the change in the resonant signal, and determining a position of the object based on the monitored change in the resonant signal. A velocity, direction of travel and/or acceleration of the object may also be determined from successive position measurements.
    Type: Grant
    Filed: August 20, 2002
    Date of Patent: October 12, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Reginald W. Hunter, Joel B. Bailey
  • Patent number: 6779226
    Abstract: Embodiments of the invention generally provide a processing system for removing contaminant particles from substrates. The processing system generally includes at least one processing enclosure having a particle removal assembly positioned therein. The particle removal assembly generally includes a substrate support member, a broadband actuator in communication with the substrate support member, and an air knife assembly positioned proximate the substrate support member. The air knife assembly is generally configured to generate a high pressure laminar flow of gas across the surface of the substrate.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: August 24, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Reginald W. Hunter, Joel Brad Bailey
  • Patent number: 6725564
    Abstract: Embodiments of the invention generally provide a multistage semiconductor processing tool, wherein the processing tool includes a first transfer chamber having a first substrate transfer robot positioned therein and at least one load lock chamber in communication with the first transfer chamber. The at least one load lock is generally configured to communicate substrates into and out of the first transfer chamber. Further, the processing tool includes at least one substrate cleaning chamber positioned in communication with the first transfer chamber. The at least one substrate cleaning chamber generally includes a substrate support member, a broadband actuation device in communication with the substrate support member, and a particle removal device configured to sweep away dislodged particles from an area proximate the substrate surface.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: April 27, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Reginald W. Hunter, Joel Brad Bailey
  • Publication number: 20040036851
    Abstract: Embodiments of the invention provide an improved method and apparatus for sensing position and/or status of an object. For one embodiment, a method generally includes illuminating the object with an optical pulse source and supplying a first optical pulse to a photo-detector, causing a resonant circuit formed by the photo-detector and an inductor to generate a resonant signal. The method also includes supplying at least a second optical pulse to the photo-detector causing a change in the resonant signal, wherein the second optical pulse is reflected from the object, monitoring the change in the resonant signal, and determining a position of the object based on the monitored change in the resonant signal. A velocity, direction of travel and/or acceleration of the object may also be determined from successive position measurements.
    Type: Application
    Filed: August 20, 2002
    Publication date: February 26, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Reginald W. Hunter, Joel B. Bailey
  • Patent number: 6684523
    Abstract: Embodiments of the invention generally provide an apparatus for removing particles from a substrate surface, wherein the apparatus includes a substrate support member configured to support a substrate thereon, and a broadband actuator in mechanical communication with the substrate support member. Additionally, an air knife assembly may be positioned proximate a perimeter of the substrate surface, and is configured to deliver a laminar stream of air across the substrate surface in order to remove the dislodged contamination particles therefrom. Alternatively, a plasma source may be used to remove dislodged particles from the area proximate the substrate surface.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: February 3, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Joel Brad Bailey, Reginald W. Hunter, Steven Gianoulakis
  • Publication number: 20030037803
    Abstract: Embodiments of the invention provide a method for removing contaminant particles from a substrate surface, where the method includes supporting a substrate in a face up position on a substrate support member and imparting a broadband impulse to the substrate support member in a direction that is substantially perpendicular to a surface of the substrate. The broadband impulse applied to the substrate support is calculated to be of sufficient magnitude to dislodge contamination particles from the surface of the substrate. The method further includes removing dislodged particles from an area proximate the substrate surface.
    Type: Application
    Filed: December 6, 2001
    Publication date: February 27, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Joel Brad Bailey, Reginald W. Hunter
  • Publication number: 20030037457
    Abstract: Embodiments of the invention generally provide an apparatus for removing particles from a substrate surface, wherein the apparatus includes a substrate support member configured to support a substrate thereon, and a broadband actuator in mechanical communication with the substrate support member. Additionally, an air knife assembly may be positioned proximate a perimeter of the substrate surface, and is configured to deliver a laminar stream of air across the substrate surface in order to remove the dislodged contamination particles therefrom. Alternatively, a plasma source may be used to remove dislodged particles from the area proximate the substrate surface.
    Type: Application
    Filed: December 6, 2001
    Publication date: February 27, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Joel Brad Bailey, Reginald W. Hunter, Steven Gianoulakis
  • Publication number: 20030037400
    Abstract: Embodiments of the invention generally provide a processing system for removing contaminant particles from substrates. The processing system generally includes at least one processing enclosure having a particle removal assembly positioned therein. The particle removal assembly generally includes a substrate support member, a broadband actuator in communication with the substrate support member, and an air knife assembly positioned proximate the substrate support member. The air knife assembly is generally configured to generate a high pressure laminar flow of gas across the surface of the substrate.
    Type: Application
    Filed: December 6, 2001
    Publication date: February 27, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Reginald W. Hunter, Joel Brad Bailey
  • Publication number: 20030037456
    Abstract: Embodiments of the invention generally provide a multistage semiconductor processing tool, wherein the processing tool includes a first transfer chamber having a first substrate transfer robot positioned therein and at least one load lock chamber in communication with the first transfer chamber. The at least one load lock is generally configured to communicate substrates into and out of the first transfer chamber. Further, the processing tool includes at least one substrate cleaning chamber positioned in communication with the first transfer chamber. The at least one substrate cleaning chamber generally includes a substrate support member, a broadband actuation device in communication with the substrate support member, and a particle removal device configured to sweep away dislodged particles from an area proximate the substrate surface.
    Type: Application
    Filed: December 6, 2001
    Publication date: February 27, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Reginald W. Hunter, Joel Brad Bailey
  • Publication number: 20030039087
    Abstract: Embodiments of the present invention generally provide a chuck for a semiconductor processing system, wherein the chuck includes an annular substrate receiving member having an upper substrate receiving surface formed thereon, a hemispherical reinforcement member affixed to a lower surface of the substrate receiving member, and an elongated stem portion affixed at a distal end to the hemispherical reinforcement member.
    Type: Application
    Filed: December 6, 2001
    Publication date: February 27, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Steven Gianoulakis, Joel Brad Bailey, Reginald W. Hunter
  • Patent number: 5260563
    Abstract: A portable laser pulse detection device. Optical pulses are sensed by a photodiode, and if the pulse width is narrow enough to yield sufficient spectral energy within the bandpass of the tuned circuits, a "laser occurred" indication will be produced by the processing circuitry. Automatic adjustment of the detected output for non-laser incident radiation is made by varying the signal level into a sequential detection logarithmic amplifier by a voltage proportional to the integral of the incident radiation over a short period of time. The device is shielded against electromagnetic interference and adapts automatically to variations in background noise.
    Type: Grant
    Filed: November 9, 1992
    Date of Patent: November 9, 1993
    Assignee: Tracor, Inc.
    Inventors: Reginald W. Hunter, Gerald D. Powell, Ronald E. Ham, Joseph Lenhardt, Thomas G. Ratliff