Patents by Inventor Reginald W. Hunter
Reginald W. Hunter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20080288369Abstract: In one embodiment, a method of viewing eyewear products is provided, which includes capturing a digital image of a consumer; standardizing the digital image of the consumer to a set coordinate system, providing a database containing a collection of eyewear images, wherein the images represent actual products for sale, searching the database of eyewear images using criteria input by the consumer, selecting an eyewear image from the search results, superimposing the selected eyewear image onto the digital image of the consumer to give the appearance of the consumer wearing the eyewear, and viewing the image of the eyewear superimposed on the consumer.Type: ApplicationFiled: February 26, 2008Publication date: November 20, 2008Inventor: Reginald W. Hunter
-
Patent number: 6805137Abstract: Embodiments of the invention provide a method for removing contaminant particles from a substrate surface, where the method includes supporting a substrate in a face up position on a substrate support member and imparting a broadband impulse to the substrate support member in a direction that is substantially perpendicular to a surface of the substrate. The broadband impulse applied to the substrate support is calculated to be of sufficient magnitude to dislodge contamination particles from the surface of the substrate. The method further includes removing dislodged particles from an area proximate the substrate surface.Type: GrantFiled: December 6, 2001Date of Patent: October 19, 2004Assignee: Applied Materials, Inc.Inventors: Joel Brad Bailey, Reginald W. Hunter
-
Patent number: 6803998Abstract: Embodiments of the invention provide an improved method and apparatus for sensing position and/or status of an object. For one embodiment, a method generally includes illuminating the object with an optical pulse source and supplying a first optical pulse to a photo-detector, causing a resonant circuit formed by the photo-detector and an inductor to generate a resonant signal. The method also includes supplying at least a second optical pulse to the photo-detector causing a change in the resonant signal, wherein the second optical pulse is reflected from the object, monitoring the change in the resonant signal, and determining a position of the object based on the monitored change in the resonant signal. A velocity, direction of travel and/or acceleration of the object may also be determined from successive position measurements.Type: GrantFiled: August 20, 2002Date of Patent: October 12, 2004Assignee: Applied Materials, Inc.Inventors: Reginald W. Hunter, Joel B. Bailey
-
Patent number: 6779226Abstract: Embodiments of the invention generally provide a processing system for removing contaminant particles from substrates. The processing system generally includes at least one processing enclosure having a particle removal assembly positioned therein. The particle removal assembly generally includes a substrate support member, a broadband actuator in communication with the substrate support member, and an air knife assembly positioned proximate the substrate support member. The air knife assembly is generally configured to generate a high pressure laminar flow of gas across the surface of the substrate.Type: GrantFiled: December 6, 2001Date of Patent: August 24, 2004Assignee: Applied Materials, Inc.Inventors: Reginald W. Hunter, Joel Brad Bailey
-
Patent number: 6725564Abstract: Embodiments of the invention generally provide a multistage semiconductor processing tool, wherein the processing tool includes a first transfer chamber having a first substrate transfer robot positioned therein and at least one load lock chamber in communication with the first transfer chamber. The at least one load lock is generally configured to communicate substrates into and out of the first transfer chamber. Further, the processing tool includes at least one substrate cleaning chamber positioned in communication with the first transfer chamber. The at least one substrate cleaning chamber generally includes a substrate support member, a broadband actuation device in communication with the substrate support member, and a particle removal device configured to sweep away dislodged particles from an area proximate the substrate surface.Type: GrantFiled: December 6, 2001Date of Patent: April 27, 2004Assignee: Applied Materials, Inc.Inventors: Reginald W. Hunter, Joel Brad Bailey
-
Publication number: 20040036851Abstract: Embodiments of the invention provide an improved method and apparatus for sensing position and/or status of an object. For one embodiment, a method generally includes illuminating the object with an optical pulse source and supplying a first optical pulse to a photo-detector, causing a resonant circuit formed by the photo-detector and an inductor to generate a resonant signal. The method also includes supplying at least a second optical pulse to the photo-detector causing a change in the resonant signal, wherein the second optical pulse is reflected from the object, monitoring the change in the resonant signal, and determining a position of the object based on the monitored change in the resonant signal. A velocity, direction of travel and/or acceleration of the object may also be determined from successive position measurements.Type: ApplicationFiled: August 20, 2002Publication date: February 26, 2004Applicant: Applied Materials, Inc.Inventors: Reginald W. Hunter, Joel B. Bailey
-
Patent number: 6684523Abstract: Embodiments of the invention generally provide an apparatus for removing particles from a substrate surface, wherein the apparatus includes a substrate support member configured to support a substrate thereon, and a broadband actuator in mechanical communication with the substrate support member. Additionally, an air knife assembly may be positioned proximate a perimeter of the substrate surface, and is configured to deliver a laminar stream of air across the substrate surface in order to remove the dislodged contamination particles therefrom. Alternatively, a plasma source may be used to remove dislodged particles from the area proximate the substrate surface.Type: GrantFiled: December 6, 2001Date of Patent: February 3, 2004Assignee: Applied Materials, Inc.Inventors: Joel Brad Bailey, Reginald W. Hunter, Steven Gianoulakis
-
Publication number: 20030037803Abstract: Embodiments of the invention provide a method for removing contaminant particles from a substrate surface, where the method includes supporting a substrate in a face up position on a substrate support member and imparting a broadband impulse to the substrate support member in a direction that is substantially perpendicular to a surface of the substrate. The broadband impulse applied to the substrate support is calculated to be of sufficient magnitude to dislodge contamination particles from the surface of the substrate. The method further includes removing dislodged particles from an area proximate the substrate surface.Type: ApplicationFiled: December 6, 2001Publication date: February 27, 2003Applicant: Applied Materials, Inc.Inventors: Joel Brad Bailey, Reginald W. Hunter
-
Publication number: 20030037457Abstract: Embodiments of the invention generally provide an apparatus for removing particles from a substrate surface, wherein the apparatus includes a substrate support member configured to support a substrate thereon, and a broadband actuator in mechanical communication with the substrate support member. Additionally, an air knife assembly may be positioned proximate a perimeter of the substrate surface, and is configured to deliver a laminar stream of air across the substrate surface in order to remove the dislodged contamination particles therefrom. Alternatively, a plasma source may be used to remove dislodged particles from the area proximate the substrate surface.Type: ApplicationFiled: December 6, 2001Publication date: February 27, 2003Applicant: Applied Materials, Inc.Inventors: Joel Brad Bailey, Reginald W. Hunter, Steven Gianoulakis
-
Publication number: 20030037400Abstract: Embodiments of the invention generally provide a processing system for removing contaminant particles from substrates. The processing system generally includes at least one processing enclosure having a particle removal assembly positioned therein. The particle removal assembly generally includes a substrate support member, a broadband actuator in communication with the substrate support member, and an air knife assembly positioned proximate the substrate support member. The air knife assembly is generally configured to generate a high pressure laminar flow of gas across the surface of the substrate.Type: ApplicationFiled: December 6, 2001Publication date: February 27, 2003Applicant: Applied Materials, Inc.Inventors: Reginald W. Hunter, Joel Brad Bailey
-
Publication number: 20030037456Abstract: Embodiments of the invention generally provide a multistage semiconductor processing tool, wherein the processing tool includes a first transfer chamber having a first substrate transfer robot positioned therein and at least one load lock chamber in communication with the first transfer chamber. The at least one load lock is generally configured to communicate substrates into and out of the first transfer chamber. Further, the processing tool includes at least one substrate cleaning chamber positioned in communication with the first transfer chamber. The at least one substrate cleaning chamber generally includes a substrate support member, a broadband actuation device in communication with the substrate support member, and a particle removal device configured to sweep away dislodged particles from an area proximate the substrate surface.Type: ApplicationFiled: December 6, 2001Publication date: February 27, 2003Applicant: Applied Materials, Inc.Inventors: Reginald W. Hunter, Joel Brad Bailey
-
Publication number: 20030039087Abstract: Embodiments of the present invention generally provide a chuck for a semiconductor processing system, wherein the chuck includes an annular substrate receiving member having an upper substrate receiving surface formed thereon, a hemispherical reinforcement member affixed to a lower surface of the substrate receiving member, and an elongated stem portion affixed at a distal end to the hemispherical reinforcement member.Type: ApplicationFiled: December 6, 2001Publication date: February 27, 2003Applicant: Applied Materials, Inc.Inventors: Steven Gianoulakis, Joel Brad Bailey, Reginald W. Hunter
-
Patent number: 5260563Abstract: A portable laser pulse detection device. Optical pulses are sensed by a photodiode, and if the pulse width is narrow enough to yield sufficient spectral energy within the bandpass of the tuned circuits, a "laser occurred" indication will be produced by the processing circuitry. Automatic adjustment of the detected output for non-laser incident radiation is made by varying the signal level into a sequential detection logarithmic amplifier by a voltage proportional to the integral of the incident radiation over a short period of time. The device is shielded against electromagnetic interference and adapts automatically to variations in background noise.Type: GrantFiled: November 9, 1992Date of Patent: November 9, 1993Assignee: Tracor, Inc.Inventors: Reginald W. Hunter, Gerald D. Powell, Ronald E. Ham, Joseph Lenhardt, Thomas G. Ratliff