Patents by Inventor Reha M. Bafrali

Reha M. Bafrali has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reticle Constructions and Photo-Processing Methods
    Publication number: 20240126164
    Abstract: Some embodiments include a reticle which includes first pattern features and second pattern features. A first optimal dose of actinic radiation is associated with the first pattern features and a second optimal dose of the actinic radiation is associated with the second pattern features. The second pattern features are larger than the first pattern features. Each of the second pattern features has a configuration which includes a central region laterally surrounded by an outer region, with the central region being of different opacity than the outer region. The configurations of the second pattern features balance the second optimal dose of the actinic radiation to be within about 5% of the first optimal dose of the actinic radiation. Some embodiments include photo-processing methods.
    Type: Application
    Filed: December 19, 2023
    Publication date: April 18, 2024
    Applicant: Micron Technology, Inc.
    Inventors: Chung-Yi Lee, Reha M. Bafrali
  • Reticle constructions and photo-processing methods
    Patent number: 11874595
    Abstract: Some embodiments include a reticle which includes first pattern features and second pattern features. A first optimal dose of actinic radiation is associated with the first pattern features and a second optimal dose of the actinic radiation is associated with the second pattern features. The second pattern features are larger than the first pattern features. Each of the second pattern features has a configuration which includes a central region laterally surrounded by an outer region, with the central region being of different opacity than the outer region. The configurations of the second pattern features balance the second optimal dose of the actinic radiation to be within about 5% of the first optimal dose of the actinic radiation. Some embodiments include photo-processing methods.
    Type: Grant
    Filed: January 28, 2021
    Date of Patent: January 16, 2024
    Assignee: Micron Technology, Inc.
    Inventors: Chung-Yi Lee, Reha M. Bafrali
  • Reticle Constructions and Photo-Processing Methods
    Publication number: 20220066313
    Abstract: Some embodiments include a reticle which includes first pattern features and second pattern features. A first optimal dose of actinic radiation is associated with the first pattern features and a second optimal dose of the actinic radiation is associated with the second pattern features. The second pattern features are larger than the first pattern features. Each of the second pattern features has a configuration which includes a central region laterally surrounded by an outer region, with the central region being of different opacity than the outer region. The configurations of the second pattern features balance the second optimal dose of the actinic radiation to be within about 5% of the first optimal dose of the actinic radiation. Some embodiments include photo-processing methods.
    Type: Application
    Filed: January 28, 2021
    Publication date: March 3, 2022
    Applicant: Micron Technology, Inc.
    Inventors: Chung-Yi Lee, Reha M. Bafrali