Abstract: A colored resin component includes a colorant having maximum absorbance in a wavelength band of 700 nm or higher and 1100 nm or lower, a copolymer including a first repeating unit derived from an acrylic monomer having an epoxy group, a second repeating unit derived from a monomer having a phenolic hydroxyl group, and a third repeating unit derived from an acrylic monomer having an aromatic ring, or a third repeating unit derived from an acrylic monomer having an alicyclic structure, and a solvent compatible with the colorant and the copolymer.

Abstract: An infrared cut filter including a film that includes a cyanine dye including a cation having a polymethine and a nitrogen-containing heterocycle at each end of the polymethine, and a tris(pentafluoroethyl)trifluorophosphate anion, and a copolymer including a first repeating unit from a first monomer that is an acrylic monomer having a cyclic ether group, and a second repeating unit from a second monomer that is a monomer having a functional group that reacts with the cyclic ether group.

Abstract: An infrared cut-off filter, including a cyanine dye and a copolymer. The cyanine dye includes tris(pentafluoroethyl) trifluorophosphate and a cation having a polymethine and a nitrogen-containing heterocycle at each end of the polymethine. The copolymer includes a first repeating unit from a first monomer and a second repeating unit from a second monomer different from the first monomer. The first monomer includes a phenolic hydroxyl group.

Abstract: A method for producing an infrared light cut filter, including forming an infrared light cut layer comprising an infrared light absorbing dye, forming a protective layer on the infrared light cut layer which provides protection against a stripping solution, forming a resist pattern on the protective layer, patterning the protective layer and the infrared light cut layer by dry etching based on the resist pattern, and removing the resist pattern from the protective layer by applying the stripping solution.

Abstract: A method of manufacturing a filter for a solid-state imaging element, including forming a color filter on a semiconductor substrate, forming an etching stopper layer on the semiconductor substrate and the color filter, forming an infrared cut precursor layer on the etching stopper layer, forming a resist pattern that covers a portion on the color filter in the infrared cut precursor layer, and forming an infrared cut filter by dry etching the infrared cut precursor layer using the resist pattern. The dry etching of the infrared cut precursor layer is conducted at an etching rate different from an etching rate of the etching stopper layer.

Abstract: An infrared cut-off filter including a cyanine dye including a tris(pentafluoroethyl) trifluorophosphate anion and a cation having a polymethine and a nitrogen-containing heterocycle located at each end of the polymethine, and an acrylic polymer having a unit structure of formula (1).

Abstract: A solid-state image sensor filter includes: a light-incident surface on which light is incident; an infrared filter located on a side of a photoelectric conversion element on which the light-incident surface is disposed; and a barrier layer located on a side of the infrared filter on which the light-incident surface is disposed, the barrier layer being provided to suppress transmission of an oxidation source to thereby prevent the infrared filter from being oxidized.

Abstract: A transparent conductive laminate which does not cause erroneous operation under high temperature and high humidity and a touch panel which includes the transparent conductive laminate are provided. The transparent conductive laminate includes a transparent base material; and a transparent electrode layer containing resin which is disposed on one or both sides of the transparent base material, wherein the transparent electrode layer includes a plurality of conductive regions which contain fibrous metals, and a non-conductive region, and the transparent electrode layer has a thickness of 30 nm or more and 150 nm or less.

Abstract: A transparent conductive laminate which does not cause erroneous operation under high temperature and high humidity and a touch panel which includes the transparent conductive laminate are provided. The transparent conductive laminate includes a transparent base material; and a transparent electrode layer containing resin which is disposed on one or both sides of the transparent base material, wherein the transparent electrode layer includes a plurality of conductive regions which contain fibrous metals, and a non-conductive region, and the transparent electrode layer has a thickness of 30 nm or more and 150 nm or less.