Patents by Inventor Reiko Kimura
Reiko Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9170488Abstract: A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed using a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer, a radiation-sensitive acid generator, and an acid diffusion controller which includes a compound having an amide group. The polymer has a weight average molecular weight in terms of the polystyrene equivalent of greater than 6,000 and includes a first structural unit that includes an acid-labile group. The polymer includes less than 5 mol % or 0 mol % of a second structural unit that includes a hydroxyl group.Type: GrantFiled: June 17, 2014Date of Patent: October 27, 2015Assignee: JSR CORPORATIONInventors: Hirokazu Sakakibara, Taiichi Furukawa, Reiko Kimura, Masafumi Hori
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Patent number: 9164387Abstract: A pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed. A developer solution used in developing the exposed resist film includes no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a first polymer and a radiation-sensitive acid generator. The first polymer includes a first structural unit having an acid-labile group and an alicyclic group. The alicyclic group is capable of avoiding dissociation from a molecular chain by an action of an acid.Type: GrantFiled: April 3, 2013Date of Patent: October 20, 2015Assignee: JSR CORPORATIONInventors: Hirokazu Sakakibara, Masafumi Hori, Koji Ito, Reiko Kimura, Taiichi Furukawa
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Patent number: 9122163Abstract: A pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed. A developer solution used in developing the exposed resist film includes no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a first polymer and a radiation-sensitive acid generator. The first polymer includes a first structural unit having an acid-labile group and an alicyclic group. The alicyclic group is capable of avoiding dissociation from a molecular chain by an action of an acid.Type: GrantFiled: April 3, 2013Date of Patent: September 1, 2015Assignee: JSR CORPORATIONInventors: Hirokazu Sakakibara, Masafumi Hori, Koji Ito, Reiko Kimura, Taiichi Furukawa
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Patent number: 9046765Abstract: A resist pattern-forming method includes providing a resist film having a surface free energy of 30 to 40 mN/m on a substrate using a radiation-sensitive resin composition. The resist film is exposed by applying radiation via a mask. The exposed resist film is developed. It is preferable that the exposing of the resist film includes exposing the resist film via an immersion liquid that is provided over the resist film.Type: GrantFiled: September 26, 2013Date of Patent: June 2, 2015Assignee: JSR CORPORATIONInventors: Hiromitsu Nakashima, Toru Kimura, Yusuke Asano, Masafumi Hori, Reiko Kimura, Kazuki Kasahara, Hiromu Miyata, Masafumi Yoshida
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Publication number: 20140295350Abstract: A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed using a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer, a radiation-sensitive acid generator, and an acid diffusion controller which includes a compound having an amide group. The polymer has a weight average molecular weight in terms of the polystyrene equivalent of greater than 6,000 and includes a first structural unit that includes an acid-labile group. The polymer includes less than 5 mol % or 0 mol % of a second structural unit that includes a hydroxyl group.Type: ApplicationFiled: June 17, 2014Publication date: October 2, 2014Inventors: Hirokazu SAKAKIBARA, Taiichi FURUKAWA, Reiko KIMURA, Masafumi HORI
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Patent number: 8795954Abstract: A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed using a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer and a radiation-sensitive acid generator. The polymer has a weight average molecular weight in terms of the polystyrene equivalent of greater than 6,000 and includes a first structural unit that includes an acid-labile group. The polymer includes less than 5 mol % or 0 mol % of a second structural unit that includes a hydroxyl group.Type: GrantFiled: April 12, 2013Date of Patent: August 5, 2014Assignee: JSR CorporationInventors: Hirokazu Sakakibara, Taiichi Furukawa, Reiko Kimura, Masafumi Hori
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Publication number: 20140023968Abstract: A resist pattern-forming method includes providing a resist film having a surface free energy of 30 to 40 mN/m on a substrate using a radiation-sensitive resin composition. The resist film is exposed by applying radiation via a mask. The exposed resist film is developed.Type: ApplicationFiled: September 26, 2013Publication date: January 23, 2014Applicant: JSR CORPORATIONInventors: Hiromitsu NAKASHIMA, Toru KIMURA, Yusuke ASANO, Masafumi HORI, Reiko KIMURA, Kazuki KASAHARA, Hiromu MIYATA, Masafumi YOSHIDA
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Patent number: 8609319Abstract: A radiation-sensitive resin composition that includes (A) a polymer that includes a repeating unit (a1) and a fluorine atom, the repeating unit (a1) including a group shown by the following formula (1) or (2), the radiation-sensitive resin composition including the polymer (A) in an amount of 0.1 mass % or more and less than 20 mass % based on the total amount of polymers included in the radiation-sensitive resin composition.Type: GrantFiled: September 23, 2011Date of Patent: December 17, 2013Assignee: JSR CorporationInventors: Toru Kimura, Hiromitsu Nakashima, Reiko Kimura, Kazuki Kasahara, Masafumi Hori, Masafumi Yoshida
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Patent number: 8609318Abstract: A radiation-sensitive resin composition includes (A) a polymer that includes a structural unit (I) including a group shown by the following formula (i), (B) a photoacid generator, and (C) a polymer that has a fluorine atom content lower than that of the polymer (A), and includes an acid-labile group. The polymer (A) preferably includes a structural unit shown by the following formula (1) as the structural unit (I). It is preferable that X in the formula (1) represent a divalent or trivalent chain-like hydrocarbon group or alicyclic hydrocarbon group.Type: GrantFiled: August 5, 2011Date of Patent: December 17, 2013Assignee: JSR CorporationInventors: Kazuo Nakahara, Hiromitsu Nakashima, Reiko Kimura
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Patent number: 8609321Abstract: A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.Type: GrantFiled: March 8, 2013Date of Patent: December 17, 2013Assignee: JSP CorporationInventors: Hiromitsu Nakashima, Reiko Kimura, Kazuo Nakahara, Mitsuo Sato
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Publication number: 20120082935Abstract: [Problem] To provide a resist film that exhibits high surface hydrophobicity during liquid immersion lithography, suppresses occurrence of defects due to development failure, and exhibits excellent lithographic performance [Solution] A radiation-sensitive resin composition that includes (A) a polymer that includes a repeating unit (a1) and a fluorine atom, the repeating unit (a1) including a group shown by the following formula (1) or (2), the radiation-sensitive resin composition including the polymer (A) in an amount of 0.1 mass % or more and less than 20 mass % based on the total amount of polymers included in the radiation-sensitive resin composition.Type: ApplicationFiled: September 23, 2011Publication date: April 5, 2012Applicant: JSR CorporationInventors: Toru Kimura, Hiromitsu Nakashima, Reiko Kimura, Kazuki Kasahara, Masafumi Hori, Masafumi Yoshida
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Publication number: 20120034560Abstract: A radiation-sensitive resin composition includes (A) a polymer that includes a structural unit (I) including a group shown by the following formula (i), (B) a photoacid generator, and (C) a polymer that has a fluorine atom content lower than that of the polymer (A), and includes an acid-labile group. The polymer (A) preferably includes a structural unit shown by the following formula (1) as the structural unit (I). It is preferable that X in the formula (1) represent a divalent or trivalent chain-like hydrocarbon group or alicyclic hydrocarbon group.Type: ApplicationFiled: August 5, 2011Publication date: February 9, 2012Applicant: JSR CorporationInventors: Kazuo NAKAHARA, Hiromitsu Nakashima, Reiko Kimura
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Patent number: 5682132Abstract: A vibrating module for generating a mainly non-audible alert signal comprises a vibrating mass supported by at least one spring and having a weight and a magnet. A drive coil is supported by a coil frame for placing the vibrating mass in a continuous reciprocating motion close to a resonant frequency determined by the vibrating mass and the spring. An electrical signal supplying device supplies an electrical signal to the drive coil to vibrate the vibrating mass in a linear reciprocating motion. A vibration transmitting device transmits the vibration of the vibrating mass via the spring to an outer portion of the vibrating module to generate a mainly non-audible alert signal.Type: GrantFiled: September 25, 1995Date of Patent: October 28, 1997Assignee: Seiko Instruments Inc.Inventors: Hidetoshi Hiroyoshi, Kazutoshi Otomo, Yoshibumi Nakamura, Reiko Kimura, Shinichi Hayashizaki, Yukio Saitoh, Mitsuyasu Osada, Masashi Yamada, Yoshietsu Ono, Osamu Takahashi