Patents by Inventor Reiko NOGUCHI

Reiko NOGUCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8624244
    Abstract: A thin film transistor includes a gate electrode, a semiconductor layer, and a source electrode and a drain electrode placed on the semiconductor layer and electrically connected with the semiconductor layer. The semiconductor layer includes a light-transmitting semiconductor film and an ohmic conductive film placed on the light-transmitting semiconductor film and having a lower light transmittance than the light-transmitting semiconductor film. The ohmic conductive film is formed not to protrude from the light-transmitting semiconductor film. The ohmic conductive film is formed in separate parts with a channel part between the source electrode and the drain electrode interposed therebetween. The source electrode and the drain electrode are connected to the light-transmitting semiconductor film through the ohmic conductive film.
    Type: Grant
    Filed: January 9, 2012
    Date of Patent: January 7, 2014
    Assignee: Mitsubishi Electric Corporation
    Inventors: Reiko Noguchi, Kazunori Inoue, Masaru Aoki, Toshihiko Iwasaka
  • Patent number: 8558226
    Abstract: Provided is a thin film transistor having a semiconductor film disposed in a plurality of portions on a substrate, a source electrode and a drain electrode which are disposed, on a semiconductor film, in contact with the semiconductor film while being spaced from each other, and a gate electrode which is disposed across the source electrode and the drain electrode via a gate insulating film; an auxiliary capacitance electrode which is disposed on the semiconductor film while in contact with the semiconductor film; a source line which has the semiconductor film in a lower layer, extends from the source electrode; a gate line which extends from the gate electrode; a pixel electrode which is electrically connected to the drain electrode; and an auxiliary capacitance electrode connecting line which electrically connects the auxiliary capacitance electrodes to each other in the adjacent pixels.
    Type: Grant
    Filed: May 25, 2012
    Date of Patent: October 15, 2013
    Assignee: Mitsubishi Electric Corporation
    Inventors: Toshihiko Iwasaka, Kazunori Inoue, Masaru Aoki, Reiko Noguchi
  • Publication number: 20120305911
    Abstract: Provided is a thin film transistor having a semiconductor film disposed in a plurality of portions on a substrate, a source electrode and a drain electrode which are disposed, on a semiconductor film, in contact with the semiconductor film while being spaced from each other, and a gate electrode which is disposed across the source electrode and the drain electrode via a gate insulating film; an auxiliary capacitance electrode which is disposed on the semiconductor film while in contact with the semiconductor film; a source line which has the semiconductor film in a lower layer, extends from the source electrode; a gate line which extends from the gate electrode; a pixel electrode which is electrically connected to the drain electrode; and an auxiliary capacitance electrode connecting line which electrically connects the auxiliary capacitance electrodes to each other in the adjacent pixels.
    Type: Application
    Filed: May 25, 2012
    Publication date: December 6, 2012
    Applicant: Mitsubishi Electric Corporation
    Inventors: Toshihiko IWASAKA, Kazunori INOUE, Masaru AOKI, Reiko NOGUCHI
  • Publication number: 20120187393
    Abstract: A thin film transistor includes a gate electrode, a semiconductor layer, and a source electrode and a drain electrode placed on the semiconductor layer and electrically connected with the semiconductor layer. The semiconductor layer includes a light-transmitting semiconductor film and an ohmic conductive film placed on the light-transmitting semiconductor film and having a lower light transmittance than the light-transmitting semiconductor film. The ohmic conductive film is formed not to protrude from the light-transmitting semiconductor film. The ohmic conductive film is formed in separate parts with a channel part between the source electrode and the drain electrode interposed therebetween. The source electrode and the drain electrode are connected to the light-transmitting semiconductor film through the ohmic conductive film.
    Type: Application
    Filed: January 9, 2012
    Publication date: July 26, 2012
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Reiko NOGUCHI, Kazunori Inoue, Masaru Aoki, Toshihiko Iwasaka