Patents by Inventor Reimar Finken

Reimar Finken has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • OPTICAL ELEMENT, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR OPERATING AN OPTICAL ELEMENT
    Publication number: 20230138850
    Abstract: An optical element for a lithography system comprises an optical surface and a photoresistor having an electric photoresistor value that varies according to an amount of light incident on a region of the optical surface.
    Type: Application
    Filed: December 30, 2022
    Publication date: May 4, 2023
    Inventors: Johannes Kimling, Peter Graf, Norbert Wabra, Sonja Schneider, Reimar Finken
  • PROJECTION EXPOSURE APPARATUS WITH A THERMAL MANIPULATOR
    Publication number: 20220373899
    Abstract: A microlithographic projection exposure apparatus comprises a projection lens for projecting structures of a mask into a substrate plane via exposure radiation. At least one optical element of the projection lens is provided with a manipulator configured for the targeted input of thermal energy into the optical element, without one of further optical elements of the projection lens being significantly heated in the process. The projection exposure apparatus furthermore comprises a control device configured for controlling the exposure radiation and for controlling the manipulator so that an effect on an optical property of the projection lens that is caused by a decrease in a thermal energy input into the projection lens due to an exposure pause is at least partly compensated for by the energy input via the manipulator. Furthermore, the disclosure relates to a corresponding method for controlling a microlithographic projection exposure apparatus.
    Type: Application
    Filed: July 28, 2022
    Publication date: November 24, 2022
    Inventors: Stephanus Fengler, Reimar Finken, Ulrich Loering
  • Projection exposure system for semiconductor lithography having an optical arrangement
    Patent number: 11415894
    Abstract: A projection exposure apparatus for semiconductor technology includes an optical arrangement with an optical element having an optically effective surface. The optical arrangement also includes an actuator embedded in the optical element. The actuator is outside the optically effective surface and outside the region located behind the optically effective surface. The optical arrangement is set up to deform the optically effective surface.
    Type: Grant
    Filed: July 20, 2021
    Date of Patent: August 16, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Judith Fingerhuth, Norbert Wabra, Sonja Schneider, Ferdinand Djuric-Rissner, Peter Graf, Reimar Finken
  • PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY HAVING AN OPTICAL ARRANGEMENT
    Publication number: 20210349399
    Abstract: A projection exposure apparatus for semiconductor technology includes an optical arrangement with an optical element having an optically effective surface. The optical arrangement also includes an actuator embedded in the optical element. The actuator is outside the optically effective surface and outside the region located behind the optically effective surface. The optical arrangement is set up to deform the optically effective surface.
    Type: Application
    Filed: July 20, 2021
    Publication date: November 11, 2021
    Inventors: Judith Fingerhuth, Norbert Wabra, Sonja Schneider, Ferdinand Djuric-Rissner, Peter Graf, Reimar Finken