Patents by Inventor Reimar Spohr

Reimar Spohr has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7001501
    Abstract: In an electrolytic cell a membrane consisting of dielectric material such as an organic polymer, which separates two chambers of the electrolytic cell from each other is produced using an etching solution which is provided in one of the chambers, contains active etching ions, while the other chamber contains a solution, which does not have an etching action. An electrical field is generated through the membrane. The etching progresses along ion tracks in the membrane and first produces one funnel-shaped pore per ion track. Immediately prior to the breakthrough, the ions, which do not have an etching action, begin to penetrate the still existent thin layer with fine pores—the active layer—and displace the ions with an etching action. An intensified electric current, driven by the adjacent field, is established and the etching process at the bottom of the pore shifts sideways according to the concentration of etching ions still present. The process is stopped by deactivating the field and flushing the membrane.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: February 21, 2006
    Assignee: Gesellschaft für Schwerionenforschung mbH
    Inventors: Reimar Spohr, Yu Pavel Apel, Yuri Korchev, Zuzanna Siwy, Masaru Yoshida
  • Publication number: 20050072689
    Abstract: In an electrolytic cell a membrane consisting of dielectric material such as an organic polymer, which separates two chambers of the electrolytic cell from each other is produced using an etching solution which is provided in one of the chambers, contains active etching ions, while the other chamber contains a solution, which does not have an etching action. An electrical field is generated through the membrane. The etching progresses along ion tracks in the membrane and first produces one funnel-shaped pore per ion track. Immediately prior to the breakthrough, the ions, which do not have an etching action, begin to penetrate the still existent thin layer with fine pores—the active layer—and displace the ions with an etching action. An intensified electric current, driven by the adjacent field, is established and the etching process at the bottom of the pore shifts sideways according to the concentration of etching ions still present. The process is stopped by deactivating the field and flushing the membrane.
    Type: Application
    Filed: March 6, 2003
    Publication date: April 7, 2005
    Inventors: Reimar Spohr, Yu Apel, Yuri Korchev, Zuzanna Siwy, Masaru Yoshida
  • Patent number: 4826292
    Abstract: A diffusion plate useful for capturing a real image in an optical system. The plate has a roughened semi-transparent surface for diffusing incident radiation. The surface is comprised of cones etched therein for form a roughness. The cones have a geometry and average center-to-center distances which are precisely predetermined to correspond with either a desired angle of divergence or with a desired diffusion intensity.
    Type: Grant
    Filed: November 17, 1986
    Date of Patent: May 2, 1989
    Assignee: Gesellschaft fur Schwerionenforschung mbH
    Inventors: Reimar Spohr, Enrique Pfeng, Dieter Burchner, Poppl Thomas
  • Patent number: 4778657
    Abstract: An apparatus for determining various characteristics of particles suspended in a liquid, e.g., the deformability or other values of red blood corpuscles. The particles are transported by a method similar to the Coulter method through a measuring channel having sections which are constricted or widened over the length of the measuring channel in, e.g., a foil. The change of certain electrical characteristics of the liquid is measured during passage of each particle, which furnishes a measure of the desired particle characteristics. The volume, as well as the deformability and other characteristics, of a particle can be determined during one passage through one and the same measuring channel. This is accomplished by forming a measuring channel composed of alternate constricted and widened portions in a step-like configuration which are a plurality of cylindrical channel sections, throughout the length of the channel.
    Type: Grant
    Filed: September 9, 1986
    Date of Patent: October 18, 1988
    Assignee: Kernforschungszentrum Karlsruhe GmbH
    Inventor: Reimar Spohr
  • Patent number: 4725332
    Abstract: In a method for producing a substrate with microholes having a predetermined diameter, a test region on the substrate is irradiated with a significantly higher dosage of heavy ions than the rest of the substrate. During the development of the nuclear traces by etching, the surface of the substrate in the test region abruptly changes at a certain porosity. This macroscopically observable process is then utilized to interrupt the etching process after a precisely defined time, which is calibrated to provide microholes having a predetermined diameter on the remainder of the substrate.
    Type: Grant
    Filed: November 20, 1986
    Date of Patent: February 16, 1988
    Assignee: Gesellschaft fur Schwerionenforschung mbH
    Inventor: Reimar Spohr
  • Patent number: 4668957
    Abstract: The invention comprises a solid material that is an electrical conductor in a single direction which comprises an amorphous glass matrix containing a plurality of microscopically thin metal filaments, all of which are oriented in the direction of conductivity and extend to or near the surfaces of the solid material. This directionally conducting material is produced by subjecting a metastable glass supersaturated with metal to directed ionic radiation. On irradiation parallel microscopic holes or pores are formed which become filled with molten metal during tempering, which cool to form metallic dipole filaments. The thickness of the material and the angle of irradiation may be selected to produce dipole filaments of lengths appropriate to act as antennas for electromagnetic radiation of wavelengths from less than about 0.1 micron to about 1 mm. The direction of conductivity, i.e.
    Type: Grant
    Filed: October 12, 1984
    Date of Patent: May 26, 1987
    Assignee: Gesellschaft f/u/ r Schwerionenforschung mbH Darmstadt
    Inventor: Reimar Spohr
  • Patent number: 4613351
    Abstract: The invention comprises a solid material that is an electrical conductor in a single direction which comprises an amorphous glass matrix containing a plurality of microscopically thin metal filaments, all of which are oriented in the direction of conductivity and extend to or near the surfaces of the solid material. This directionally conducting material is produced by subjecting a metastable glass supersaturated with metal to directed ionic radiation. On irradiation parallel microscopic holes or pores are formed which become filled with molten metal during tempering, which cool to form metallic dipole filaments. The thickness of the material and the angle of irradiation may be selected to produce dipole filaments of lengths appropriate to act as antennas for electromagnetic radiation of wavelengths from about 0.1 micron to about 1 mm. The direction of conductivity, i.e.
    Type: Grant
    Filed: June 26, 1985
    Date of Patent: September 23, 1986
    Assignee: Gesellschaft fur Schwerionenforschung mbH Darmstadt
    Inventor: Reimar Spohr
  • Patent number: 4369370
    Abstract: Method for producing nuclear traces, or microholes originating from nuclear traces, from a single ion or a countable number of ions in a solid body by means of an accelerator, e.g. heavy ions in a heavy ion accelerator. A widened or attenuated beam or ions is directed onto the surface of a solid body via a preliminary aperture to cut out any non-required particles. The impinging of an individual particle, after or before passage through the solid body, is determined directly and depending of this determination, other particles which might possibly pass through the aperture are prevented from doing so.
    Type: Grant
    Filed: December 22, 1980
    Date of Patent: January 18, 1983
    Assignee: Gesellschaft fur Schwerionenforschung mbH Darmstadt
    Inventor: Reimar Spohr
  • Patent number: 4338164
    Abstract: A method for producing planar surfaces having very fine peaks in the micron range or smaller, e.g. planar field emission cathodes, of conductive or semiconductive material, by filling cavities in a matrix. A sheet of the planar dielectric material is irradiated with high energy ions, e.g. from a heavy ion accelerator to form nuclear traces therein, and is subsequently subjected to an etching process to expose the nuclear traces. Thereafter, the hole-like nuclear traces or cavities are filled with conductive or semiconductive material and one surface of the sheet of planar material is covered, at the open ends of the nuclear traces or cavities, with a coating of likewise conductive or semiconductive material. If desired the matrix of planar material may subsequently be removed.
    Type: Grant
    Filed: December 22, 1980
    Date of Patent: July 6, 1982
    Assignee: Gesellschaft fur Schwerionenforschung GmbH
    Inventor: Reimar Spohr
  • Patent number: 4314894
    Abstract: A magnetic layer for storing information in the form of a fixed, two-dimensional array of magnetic domains. The magnetic layer can be magnetized in either of two opposite directions normal to the plane of the layer. The walls of the domains are fixed by local gradients in the value and direction of the magnetic anistropy and in the value and direction of the magnetic exchange energy of the magnetic layer. The local gradients may be caused by a relatively high defect density at the domain wall locations, by implanting ions into the magnetic layer at the locations of the domain walls thereby causing a local expansion of the crystal lattice of the layer, and/or by etching a multiplicity of nonconnected tapering channels in and substantially perpendicular to the plane of the magnetic layer at these locations. Where tapering channels are used, the magnetic layer is provided on a substrate such that the crystal lattice constant of the magnetic layer is different from the crystal lattice constant of the substrate.
    Type: Grant
    Filed: November 17, 1980
    Date of Patent: February 9, 1982
    Assignee: U.S. Philips Corporation
    Inventors: Christoph Schmelzer, Reimar Spohr, Jens-Peter Krumme, Klaus Witter, Heinrich Heitmann
  • Patent number: 4274935
    Abstract: A magnetic layer for storing information in the form of a fixed, two-dimensional array of magnetic domains. The magnetic layer can be magnetized in either of two opposite directions normal to the plane of the layer. The walls of the domains are fixed by local gradients in the value and direction of the magnetic anisotropy and in the value and direction of the magnetic exchange energy of the magnetic layer. The local gradients may be caused by a relatively high defect density at the domain wall locations, by implanting ions into the magnetic layer at the locations of the domain walls thereby causing a local expansion of the crystal lattice of the layer, and/or by etching a multiplicity of non-connected tapering channels in and substantially perpendicular to the plane of the magnetic layer at these locations. Where tapering channels are used, the magnetic layer is provided on a substrate such that the crystal lattice constant of the magnetic layer is different from the crystal lattice constant of the substrate.
    Type: Grant
    Filed: July 13, 1978
    Date of Patent: June 23, 1981
    Assignee: U.S. Philips Corporation
    Inventors: Christoph Schmelzer, Reimar Spohr, Jens-Peter Krumme, Klaus Witter, Heinrich Heitmann