Abstract: The present invention relates to an illumination and imaging device for high-resolution X-ray microscopy with high photon energy, comprising an X-ray source (1) for emitting X-ray radiation and an area detector (4) for detecting the X-ray radiation. Moreover, the device comprises a monochromatizing and two-dimensionally focussing condenser-based optical system (2) arranged in the optical path of X-ray radiation with two reflective elements (6) being arranged side-by-side for focussing impinging X-ray radiation on an object to be imaged (5) and a diffractive X-ray lens (3) for imaging the object to be imaged (5) on the X-ray detector (4). Typically, the illumination and imaging device is used for performing radiography, tomography and examination of a micro-electronic component or an iron-based material.

Abstract: The present invention relates to an illumination and imaging device for high-resolution X-ray microscopy with high photon energy, comprising an X-ray source (1) for emitting X-ray radiation and an area detector (4) for detecting the X-ray radiation. Moreover, the device comprises a monochromatizing and two-dimensionally focussing condenser-based optical system (2) arranged in the optical path of X-ray radiation with two reflective elements (6) being arranged side-by-side for focussing impinging X-ray radiation on an object to be imaged (5) and a diffractive X-ray lens (3) for imaging the object to be imaged (5) on the X-ray detector (4). Typically, the illumination and imaging device is used for performing radiography, tomography and examination of a micro-electronic component or an iron-based material.

Abstract: An X-ray optical element for and influencing of X-ray beam characteristics in two dimensions includes two reflective, curved elements arranged side-by-side to receive X-ray radiation from an X-ray beam source so that the radiation is directed onto both reflective elements and then reflected from one element onto the other element, wherein the two reflective elements are curved at different angles and have different focal lengths.

Abstract: An X-ray optical element for and influencing of X-ray beam characteristics in two dimensions includes two reflective, curved elements arranged side-by-side to receive X-ray radiation from an X-ray beam source so that the radiation is directed onto both reflective elements and then reflected from one element onto the other element, wherein the two reflective elements are curved at different angles and have different focal lengths.

Abstract: The invention relates to a device for X-ray analytical applications such as X-ray diffractometry, reflectometry and/or fluorescence analysis. The aim of the invention is to monochromatize, focus and optionally transform the X-radiation of a focal spot of a point of an X radiation source into a parallel, high photon density radiation in a highly precise manner. Parallel X radiation having a point-shaped primary beam cross-section is thus directed at a concavely curved, parabolic reflecting element which is used to focus and monchromatize the X radiation by means of a gradient and multilayered system embodied on the reflecting element. At least one screen is arranged between the X radiation source and the reflecting element.

Abstract: A pulsed laser deposition (PLD) process is used for forming a functional metal, ceramic, or ceramic/metal layer on an inner wall of a hollow body. Simultaneously with the deposition process, a thin-film laser treatment is carried out, whereby a laser beam impinges on the coating layer as it is being formed to achieve a rapid heating followed by a rapid cooling and solidification of the deposited coating layer. In this context, the energy and material flux densities are prescribed and controlled as a function of the spacing of the condensation region from the substrate surface. Laser pulses having an energy of 1 to 2 Joules and a pulse repetition rate of 10 to 50 Hz are used. The pulse duration as well as the residual gas atmosphere in the vacuum deposition chamber are controlled so that the generated plasma flux forms the desired layered grain structure, namely a glassy amorphous structure, a columnar structure, or a polycrystalline structure.

Abstract: A method for depositing a thin layer on a substrate by laser pulse vapor deposition provides a substantially cylindrical target having a cylinder axis and a curved target surface. A pulsed laser beam is generated having an initial path section and an initial path section axis and is capable of producing a plasma plume from the target when the pulsed laser beam impinges on the curved target surface. A first mirror located between the target and the initial path section of the laser beam is provided having a plurality of reflective interior surfaces and a first mirror axis substantially coincident with an initial path section axis of the laser beam. The laser beam is deflected so as to impinge on the reflective interior surface of the first mirror and subsequently to be reflected and to impinge on the curved target surface by controlling a plane reflective mirror that intersects the first mirror axis and is located on a side of the first mirror opposite from the target.

Abstract: A method for depositing a thin layer on a substrate by laser pulse vapor deposition provides a substantially cylindrical target having a cylinder axis and a curved target surface. A pulsed laser beam is generated having an initial path section and an initial path section axis and is capable of producing a plasma plume from the target when the pulsed laser beam impinges on the curved target surface. A first mirror located between the target and the initial path section of the laser beam is provided having a plurality of reflective interior surfaces and a first mirror axis substantially coincident with an initial path section axis of the laser beam. The laser beam is deflected so as to impinge on the reflective interior surface of the first mirror and subsequently to be reflected and to impinge on the curved target surface by controlling a plane reflective mirror that intersects the first mirror axis and is located on a side of the first mirror opposite from the target.