Abstract: The invention relates to a device for measuring scattered light, comprising at least one focusing element provided with electromagnetic radiation that can be focused on a sample, a detector and a detector optical system with which electromagnetic radiation scattered by the sample can be conducted to the detector. The device is characterized in that it comprises means for forming an annular beam such that said annular beam can be focused on a focus point inside the sample by the at least one focusing element and that electromagnetic radiation scattered by the sample can be detected by the detection optical system, said electromagnetic radiation dispersing inside the area surrounded by the annular beam.

Abstract: The invention relates to a method and a device for carrying out emission spectroscopy, in particular laser emission spectroscopy. According to said method, a pulsed laser beam is automatically focussed on a workpiece to generate a laser-induced plasma, the radiation emitted from the plasma is detected and an elemental analysis is performed using the captured radiation spectrum. The invention is characterised in that a laser beam impingement is carried out with a variable pulse interval ?T, that prior to the plasma generation, additional geometric parameters P1, P2 . . . PN of a potential measurement location on the workpiece surface, in addition to the distance d of the autofocus lens from said workpiece surface are determined and in that an elemental analysis is only performed for the potential measurement locations, at which at least one of the additional geometric parameters lies within a predefined tolerance range [T1 . . . T2].

Abstract: The invention relates to a method and a device for carrying out emission spectroscopy, in particular laser emission spectroscopy. According to said method, a pulsed laser beam is automatically focussed on a workpiece to generate a laser-induced plasma, the radiation emitted from the plasma is detected and an elemental analysis is performed using the captured radiation spectrum. The invention is characterised in that a laser beam impingement is carried out with a variable pulse interval ?T, that prior to the plasma generation, additional geometric parameters P 1, P 2 . . . PN of a potential measurement location on the workpiece surface, in addition to the distance d of the autofocus lens from said workpiece surface are determined and in that an elemental analysis is only performed for the potential measurement locations, at which at least one of the additional geometric parameters lies within a predefined tolerance range [T1 . . . T2].

Abstract: Process for emission spectroscopy, particularly for laser emission spectropy, wherein the radiation emitted by the laser-induced plasma of the workpiece to be analyzed is decomposed by a spectrometer and at least one fraction of the found spectrum is transferred to a processing unit. In order to improve the process from the point of view of measurement precision and speed, it is carried out in such a manner that an influencing of the intensity of the plasma-inducing laser beam takes place depending on at least one emission-influencing parameter for the production of definite plasma states, this parameter being measured during plasma formation, and that the transfer of the found spectrum or of a fraction thereof to the processing unit is performed, as long as the measured plasma parameter is within a predetermined tolerance range (T.sub.I./.T.sub.II).